Inventor
Frank B. Kaufman
Inventor
Amawalk, NY, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing9%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
C09GPolishing compositions7%
H05KPrinted circuits7%
B24DTools for grinding, buffing or sharpening4%
G03CPhotosensitive materials for photographic purposes4%
PatentTitleYear
8,162,723'Method of polishing a tungsten carbide surface'20127,468,766'Reflective spatial light modulator array including a light blocking layer'20087,037,175'Method of sharpening cutting edges'20066,632,377'Chemical-mechanical planarization of metallurgy'20036,424,388'Reflective spatial light modulator array'20026,126,532'Polishing pads for a semiconductor substrate'20006,062,968'Polishing pad for a semiconductor substrate'20005,706,067'Reflective spatial light modulator array'19984,954,142'Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor'19904,886,734'Electron-beam positive polyimide'19894,877,718'Positive-working photosensitive polyimide operated by photo induced molecular weight changes'19894,702,792'Method of forming fine conductive lines, patterns and connectors'19874,543,319'Polystyrene-tetrathiafulvalene polymers as deep-ultraviolet mask material'19854,360,583'High resolution video storage disk'19824,155,866'Method of controlling silicon wafer etching rates-utilizing a diazine catalyzed etchant'19794,142,783'Reversible electrochromic display device having memory'19794,082,552'Process of optically printing highly conductive character utilizing a medium containing a halogenated hydrocarbon photoactivator and a tetrathiafulvalene or a related compound thereof'19784,036,648'Highly conductive printing medium containing a halogenated hydrocarbon photoactivator and a tetrathiafulvalene or a related compound thereof'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–2008Patents assigned to IBM (14)· patent assignee history
1977–1979Based in New York, NY, US· patent location history
1982Based in Ossining, NY, US· patent location history
1985–2008Based in Amawalk, NY, US· patent location history
1989Patents assigned to RENNSSELAER POLYTECHNIC INST (1)· patent assignee history
2000Patents assigned to CABOT CORP (2)· patent assignee history
2000–2012Based in Geneva, IL, US· patent location history
2006–2012Patents assigned to CABOT MICROELECTRONICS CORP (2)· patent assignee history
2012Patents assigned to KAUFMAN FRANK B (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 14 | 1977–2008 |
| CABOT CORP | 2 | 2000 |
| CABOT MICROELECTRONICS CORP | 2 | 2006–2012 |
| KAUFMAN FRANK Bself | 1 | 2012 |
| RENNSSELAER POLYTECHNIC INST | 1 | 1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Amawalk, New York, US | 7 | 1985–2008 |
| Geneva, Illinois, US | 6 | 2000–2012 |
| New York, New York, US | 4 | 1977–1979 |
| Ossining, New York, US | 1 | 1982 |