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Inventor

David Lucien Anstotz

Inventor
Eindhoven, NL

Overview

4→
Patents
2013–2014
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices80%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them20%
PatentTitleYear
8,780,321'Lithographic apparatus and device manufacturing method'20148,638,421'Lithographic apparatus and method of cleaning a lithographic apparatus'20148,587,762'Methods relating to immersion lithography and an immersion lithographic apparatus'20138,514,365'Lithographic apparatus and device manufacturing method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2014Patents assigned to ANSTOTZ DAVID LUCIEN (4)· patent assignee history
2013–2014Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2013–2014Patents assigned to JACOBS JOHANNES HENRICUS WILHELMUS (2)· patent assignee history
2013–2014Patents assigned to KADIJK EDWIN CORNELIS (2)· patent assignee history
2013–2014Patents assigned to VAN DER HOEVEN JAN CORNELIS (2)· patent assignee history
2013Based in Westhoffen, FR· patent location history
2014Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ANSTOTZ DAVID LUCIENself42013–2014
ASML NETHERLANDS BV42013–2014
JACOBS JOHANNES HENRICUS WILHELMUS22013–2014
KADIJK EDWIN CORNELIS22013–2014
VAN DER HOEVEN JAN CORNELIS22013–2014
Locations
LocationPatentsSpan
Eindhoven, NL22014
Westhoffen, FR22013