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Inventor

Hidetoshi Nakata

Inventor
Kita-adachi-gun, JP

Overview

17→
Patents
1991–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere22%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein14%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds12%
G02BOptical elements, systems or apparatus12%
H10BElectronic memory devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C07DHeterocyclic compounds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
H01LSemiconductor devices4%
PatentTitleYear
10,473,820Compound containing mesogenic group, and mixture, composition, and optically anisotropic body using said compound201910,351,643Polymerizable compounds, compositions, polymers, optically anisotropic articles, liquid crystal display devices and organic EL devices201910,196,568Production method for polymerizable liquid crystal composition201910,106,738Polymerizable liquid crystal composition, and anisotropic optical body, retardation film, antireflective film, and liquid crystal, display element fabricated using composition20189,809,668'Polymerizable compound, composition, polymer, optically anisotropic body, liquid crystal display device, and organic EL device'20179,676,959'Polymerizable composition solution and optically anisotropic body including the same'20179,469,810'Polymerizable liquid crystal composition and thin film using same'20168,361,343'Nematic liquid crystal composition and bistable nematic liqud crystal display'20138,252,202'Nematic liquid crystal composition and bistable nematic liquid crystal display'20128,017,511'Method of manufacturing semiconductor device'20117,375,018'Method of manufacturing semiconductor device'20087,112,290'Liquid crystal composition and liquid crystal display element'20067,108,896'Method of increasing helical twisting power, optically active compound, liquid crystal compostion containing the same, and liquid crystal display device'20066,770,533'Method of manufacturing semiconductor device, nonvolatile semiconductor memory device and method of manufacturing the same'20046,373,096'Method of manufacturing semiconductor device, nonvolatile semiconductor memory device and method of manufacturing the same'20025,254,489'Method of manufacturing semiconductor device by forming first and second oxide films by use of nitridation'19935,030,584'Method for fabricating MOS semiconductor device operable in a high voltage range using polysilicon outdiffusion'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2002Patents assigned to NEC CORP (3)· patent assignee history
1991–2004Based in Tokyo, JP· patent location history
2006–2019Patents assigned to DAINIPPON INK & CHEMICALS (11)· patent assignee history
2006Based in Ageo, JP· patent location history
2008–2011Based in Kanagawa, JP· patent location history
2012–2013Patents assigned to DOZOV IVAN (2)· patent assignee history
2012–2013Patents assigned to DUBOIS JEAN-CLAUDE (2)· patent assignee history
2012–2013Patents assigned to NAKATA HIDETOSHI (2)· patent assignee history
2012–2019Based in Kita-adachi-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAINIPPON INK & CHEMICALS112006–2019
NEC CORP31991–2002
DOZOV IVAN22012–2013
DUBOIS JEAN-CLAUDE22012–2013
NAKATA HIDETOSHIself22012–2013
Locations
LocationPatentsSpan
Kita-adachi-gun, JP92012–2019
Tokyo, JP41991–2004
Kanagawa, JP22008–2011
Ageo, JP22006