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Inventor

TAI T. NGO

Inventor
US

Overview

2→
Patents
2022–2023
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material100%
PatentTitleYear
11,821,083Gas separation control in spatial atomic layer deposition202311,230,763Gas separation control in spatial atomic layer deposition2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2023Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2022–2023Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC22022–2023
Locations
LocationPatentsSpan
US22022–2023