Inventor

Paul Jacques Van Wijnen

Inventor
Veldhoven, NL

Overview

8→
Patents
2006–2020
Patent span
Physics
Primary field (CPC G)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
G01BMeasuring length, thickness or similar linear dimensions11%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G05BControl or regulating systems in general11%
H01LSemiconductor devices11%
Y02PClimate change mitigation technologies in the production or processing of goods11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2020Patents assigned to ASML NETHERLANDS BV (8)· patent assignee history
2006–2020Based in Veldhoven, NL· patent location history
2014Patents assigned to BORNEBROEK FRANK (1)· patent assignee history
2014Patents assigned to VAN WIJNEN PAUL JACQUES (1)· patent assignee history
2014Patents assigned to VESELINOVIC PETAR (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV82006–2020
BORNEBROEK FRANK12014
VAN WIJNEN PAUL JACQUESself12014
VESELINOVIC PETAR12014
Locations
LocationPatentsSpan
Veldhoven, NL82006–2020