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Inventor

George G. Barclay

Inventor
Jefferson, MA, US

Overview

56→
Patents
1992–2020
Patent span
Physics
Primary field (CPC G)

Patents· 56 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests21%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C07CAcyclic or carbocyclic compounds3%
C08LCompositions of macromolecular compounds3%
C25DProcesses for the electrolytic or electrophoretic production of coatings3%
H05KPrinted circuits3%
H01LSemiconductor devices2%
PatentTitleYear
10,558,122Compositions comprising sulfonamide material and processes for photolithography202010,359,698Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography201910,222,699Compositions and processes for immersion lithography201910,180,627Processes for photolithography20199,507,260'Compositions and processes for photolithography'20169,255,079'Photoacid generators and photoresists comprising same'20169,244,355'Compositions and processes for immersion lithography'20169,209,028'Ion implantation methods'20159,012,128'Photoresist and coated substrate comprising same'20159,005,880'Compositions comprising sulfonamide material and processes for photolithography'20158,975,006'Compositions comprising carboxy component and processes for photolithography'20158,871,428'Compositions and processes for immersion lithography'20148,722,825'Surface active additive and photoresist composition comprising same'20148,506,788'Leveler compounds'20138,262,891'Leveler compounds'20128,257,902'Compositons and processes for immersion lithography'20127,700,256'Phenolic/alicyclic copolymers and photoresists'20107,662,981'Leveler compounds'20107,582,412'Multilayer photoresist systems'20097,510,639'Leveler compounds'20097,390,608'Photoresists containing Si-polymers'20087,306,892'Multilayer photoresist system'20077,297,616'Methods, photoresists and substrates for ion-implant lithography'20077,244,542'Resins and photoresist compositions comprising same'20077,217,490'Processes for producing silane monomers and polymers and photoresist compositions comprising same'20077,211,365'Negative photoresists for short wavelength imaging'20077,208,261'Polymers, processes for polymer synthesis and photoresist compositions'20077,189,490'Photoresists containing sulfonamide component'20077,118,847'Polymer and photoresist compositions'20067,105,266'Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same'20067,090,968'Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same'20067,022,454'Monomers, polymers, methods of synthesis thereof and photoresist compositions'20067,022,455'Photoacid-labile polymers and photoresists comprising same'20067,008,750'Processes for producing polysiloxanes and photoresist compositions comprising same'20066,855,466'Planarizing antireflective coating compositions'20056,849,381'Copolymers and photoresist compositions comprising same'20056,849,376'Polymers and photoresist compositions comprising same'20056,841,331'Polymers, processes for polymer synthesis and photoresist compositions'20056,803,171'Photoimageable composition'20046,777,157'Copolymers and photoresist compositions comprising same'20046,692,888'Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same'20046,680,159'Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same'20046,599,677'Polymer and photoresist compositions'20036,492,086'Phenolic/alicyclic copolymers and photoresists'20026,406,828'Polymer and photoresist compositions'20026,379,861'Polymers and photoresist compositions comprising same'20026,316,165'Planarizing antireflective coating compositions'20016,306,554'Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same'20016,165,674'Polymers and photoresist compositions for short wavelength imaging'20006,136,501'Polymers and photoresist compositions comprising same'20006,107,425'Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists'20006,042,997'Copolymers and photoresist compositions comprising copolymer resin binder component'20005,861,231'Copolymers and photoresist compositions comprising copolymer resin binder component'19995,344,742'Benzyl-substituted photoactive compounds and photoresist compositions comprising same'19945,248,734'Process for preparing a polyphenylene polymer'19935,136,011'Triazine networks with homogeneous and oriented structures and method for making same'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992Based in Ithaca, NY, US· patent location history
1993–2000Based in Allston, MA, US· patent location history
1999–2007Patents assigned to SHIPLEY CO LLC (31)· patent assignee history
2000–2020Based in Jefferson, MA, US· patent location history
2007–2020Patents assigned to ROHM & HAAS ELECT MAT (19)· patent assignee history
2012–2019Patents assigned to BARCLAY GEORGE G (12)· patent assignee history
2012–2019Patents assigned to WANG DEYAN (11)· patent assignee history
2012–2016Patents assigned to XU CHENG-BAI (7)· patent assignee history
2013Based in Jeffferson, MA, US· patent location history
2015Based in Chaska, MN, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHIPLEY CO LLC311999–2007
ROHM & HAAS ELECT MAT192007–2020
BARCLAY GEORGE Gself122012–2019
WANG DEYAN112012–2019
XU CHENG-BAI72012–2016
Locations
LocationPatentsSpan
Jefferson, Massachusetts, US472000–2020
Allston, Massachusetts, US61993–2000
Chaska, Minnesota, US12015
Jeffferson, Massachusetts, US12013
Ithaca, New York, US11992