Inventor
Edwin G. Haas
Inventor
Sayville, NY, US
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
H05GX-ray technique13%
B21DWorking or processing of sheet metal or metal tubes, rods or profiles without essentially removing material10%
B82YSpecific uses or applications of nanostructures10%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling7%
G01BMeasuring length, thickness or similar linear dimensions7%
Y10TTechnical subjects covered by former us classification7%
B05BSpraying apparatus5%
G05BControl or regulating systems in general5%
F25JLiquefaction, solidification or separation of gases or gaseous or liquefied gaseous mixtures by pressure and cold treatment or by bringing them into the supercritical state3%
PatentTitleYear
8,724,776'Two-axis sagittal focusing monochromator'20148,362,379'Remote switch actuator'20136,578,399'Single-die modularized, reconfigurable honeycomb core forming tool'20036,552,350'System and method for providing a lithographic light source for a semiconductor manufacturing process'20036,437,349'Fluid nozzle system and method in an emitted energy system for photolithography'20026,353,232'Holder assembly system and method in an emitted energy system for photolithography'20026,241,435'Universal adaptive machining chatter control fixture'20016,227,057'Apparatus and method for rapid strain measurement'20016,209,380'Pin tip assembly in tooling apparatus for forming honeycomb cores'20016,194,733'Method and apparatus for adjustably supporting a light source for use in photolithography'20016,190,835'System and method for providing a lithographic light source for a semiconductor manufacturing process'20016,180,952'Holder assembly system and method in an emitted energy system for photolithography'20016,105,885'Fluid nozzle system and method in an emitted energy system for photolithography'20006,089,061'Modularized reconfigurable heated forming tool'20006,065,203'Method of manufacturing very small diameter deep passages'20006,032,348'Method of forming a modularized adjustable holding fixture'20006,012,314'Individual motor pin module'20005,954,175'Modularized parallel drivetrain'19995,822,876'Surface displacement measurement gauge'19985,825,490'Interferometer comprising translation assemblies for moving a first optical member relative to a second optical member'19985,781,292'Short path scanning interferometer'19985,735,497'Self-leveling mount or platform for a rapid deployment system'19985,546,784'Adjustable form die'19965,523,893'Strain free temperature-compensated optical mounts'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2003Patents assigned to NORTHROP GRUMMAN CORP (12)· patent assignee history
1996Patents assigned to GRUMMAN AEROSPACE CORP (1)· patent assignee history
1996–1998Based in Seaford, NY, US· patent location history
1998–2014Based in Sayville, NY, US· patent location history
1999Based in Savville, NY, US· patent location history
2000–2003Patents assigned to ADVANCED ENERGY SYST (8)· patent assignee history
2013Patents assigned to BEAUMAN RONALD (1)· patent assignee history
2014Patents assigned to BROOKHAVEN SCIENCE ASS LLC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NORTHROP GRUMMAN CORP | 12 | 1996–2003 |
| ADVANCED ENERGY SYST | 8 | 2000–2003 |
| BEAUMAN RONALD | 1 | 2013 |
| BROOKHAVEN SCIENCE ASS LLC | 1 | 2014 |
| GRUMMAN AEROSPACE CORP | 1 | 1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sayville, New York, US | 20 | 1998–2014 |
| Seaford, New York, US | 3 | 1996–1998 |
| Savville, New York, US | 1 | 1999 |