Inventor
ANSHUMAN CHERALA
Inventor
US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
B82YSpecific uses or applications of nanostructures12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
B29CShaping or joining of plastics10%
H01LSemiconductor devices10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
A61BDiagnosis2%
A61FFilters implantable into blood vessels2%
A61GTransport, personal conveyances, or accommodation specially adapted for patients or disabled persons2%
B41NPrinting plates or foils2%
PatentTitleYear
12,498,634System and method for generating control values for overlay control of an imprint tool202512,463,081Apparatus including a bonding head and a method of using the same202512,317,421Apparatus including a plurality of heads and a method of using the same202512,269,282Nanoimprint lithography template with peripheral pockets, system of using the template, and method of using the template202512,153,342Nanofabrication method with correction of distortion within an imprint system202412,124,165Apparatus and method for optimizing actuator forces202411,604,409Template replication202311,567,401Nanofabrication method with correction of distortion within an imprint system202311,550,216Systems and methods for curing a shaped film202311,454,883Template replication202211,366,384Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template202211,347,144Overlay improvement in nanoimprint lithography202211,327,409Systems and methods for curing an imprinted field202211,262,652Nanofabrication method with correction of distortion within an imprint system202211,199,774Method and apparatus to improve frame cure imaging resolution for extrusion control2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to CANON KK (15)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 15 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 15 | 2021–2025 |