Inventor
Donald C. Hofer
Inventor
San Martin, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
G01RMeasuring electric variables10%
B05DProcesses for applying fluent materials to surfaces, in general6%
C08LCompositions of macromolecular compounds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
G11BInformation storage based on relative movement between record carrier and transducer6%
C08JWorking-up3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
6,653,048'High silicon content monomers and polymers suitable for 193 nm bilayer resists'2003RE038282'Process for using bilayer photoresist'20036,482,566'Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography'20026,444,408'High silicon content monomers and polymers suitable for 193 nm bilayer resists'20026,277,546'Process for imaging of photoresist'20016,165,673'Resist composition with radiation sensitive acid generator'20005,985,524'Process for using bilayer photoresist'19995,776,990'Foamed polymer for use as dielectric material'19985,585,220'Resist composition with radiation sensitive acid generator'1996RE034524'Polyimide coating compositions based on meta-dialkyldihydrogen pyromellitate and aromatic diamines'19945,045,608'Polyimide-poly(phenylquinoxaline) block copolymers'19914,849,501'Polyimide coating compositions based on meta-dialkyldihydrogen pyromellitate and aromatic diamines'19894,612,210'Process for planarizing a substrate'19864,464,460'Process for making an imaged oxygen-reactive ion etch barrier'19844,291,272'Method for reducing homonuclear broadening in magnetic resonance spectra of solids'19814,110,681'NMR field frequency lock system'19784,081,742'Quantitative analysis of nuclear magnetic resonance spectra having solvent peaks'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–2003Patents assigned to IBM (17)· patent assignee history
1978Based in Poughkeepsie, NY, US· patent location history
1981Based in Hopewell Junction, NY, US· patent location history
1984Based in Morgan Hill, CA, US· patent location history
1986–2003Based in San Martin, CA, US· patent location history
2002Patents assigned to UNIV TECHNOLOGY CORP (1)· patent assignee history
2002Based in Paso Robles, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 17 | 1978–2003 |
| UNIV TECHNOLOGY CORP | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Martin, California, US | 12 | 1986–2003 |
| Poughkeepsie, New York, US | 2 | 1978 |
| Paso Robles, California, US | 1 | 2002 |
| Morgan Hill, California, US | 1 | 1984 |
| Hopewell Junction, New York, US | 1 | 1981 |