Inventor
Jochen Koblo
Inventor
Wiesbaden, DE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Dprimary
G03DApparatus for processing exposed photographic materials60%
F04BPositive-displacement machines for liquids20%
G03CPhotosensitive materials for photographic purposes20%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1982–1983Patents assigned to HOECHST AG (4)· patent assignee history
1982–1983Based in Wiesbaden, DE· patent location history
1982Based in Wiesbaden-Auringen, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOECHST AG | 4 | 1982–1983 |
Locations
| Location | Patents | Span |
|---|---|---|
| Wiesbaden, DE | 2 | 1982–1983 |
| Wiesbaden-Auringen, DE | 2 | 1982 |