Inventor
Larry D. Hartsough
Inventor
Berkeley, CA, US
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps45%
C23CCoating metallic material23%
C03CChemical composition of glasses, glazes or vitreous enamels5%
C23FNon-mechanical removal of metallic material from surface5%
F21VFunctional features or details of lighting devices or systems thereof5%
F24SSolar heat collectors5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
6,500,321'Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target'20026,497,796'Apparatus and method for controlling plasma uniformity across a substrate'20026,444,105'Physical vapor deposition reactor including magnet to control flow of ions'20026,193,854'Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter source'20016,179,973'Apparatus and method for controlling plasma uniformity across a substrate'20015,985,115'Internally cooled target assembly for magnetron sputtering'19995,503,676'Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber'19965,417,833'Sputtering apparatus having a rotating magnet array and fixed electromagnets'19954,420,385'Apparatus and process for sputter deposition of reacted thin films'19834,260,649'Laser induced dissociative chemical gas phase processing of workpieces'19814,204,936'Method and apparatus for attaching a target to the cathode of a sputtering system'19804,125,446'Controlled reflectance of sputtered aluminum layers'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978Patents assigned to AIRCO INC (1)· patent assignee history
1978–2002Based in Berkeley, CA, US· patent location history
1980–1981Patents assigned to PERKIN ELMER CORP (2)· patent assignee history
1983Patents assigned to GRYPHON PRODUCTS (1)· patent assignee history
1995Based in Berkley, CA, US· patent location history
1996Patents assigned to LAM RES CORP (1)· patent assignee history
1999–2002Patents assigned to NOVELLUS SYSTEMS INC (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NOVELLUS SYSTEMS INC | 6 | 1999–2002 |
| PERKIN ELMER CORP | 2 | 1980–1981 |
| AIRCO INC | 1 | 1978 |
| GRYPHON PRODUCTS | 1 | 1983 |
| LAM RES CORP | 1 | 1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Berkeley, California, US | 11 | 1978–2002 |
| Berkley, California, US | 1 | 1995 |