Inventor
Regina Freed
Inventor
Los Altos, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1028%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01JElectric discharge tubes or discharge lamps7%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G01RMeasuring electric variables4%
B82YSpecific uses or applications of nanostructures2%
G01BMeasuring length, thickness or similar linear dimensions2%
H10DInorganic electric semiconductor devices2%
PatentTitleYear
11,133,152Methods and apparatus for performing profile metrology on semiconductor structures202111,062,942Methods for controllable metal and barrier-liner recess202111,037,825Selective removal process to create high aspect ratio fully self-aligned via202110,892,187Method for creating a fully self-aligned via202110,892,183Methods for removing metal oxides202110,790,191Selective removal process to create high aspect ratio fully self-aligned via202010,777,414Methods for reducing transfer pattern defects in a semiconductor device202010,699,953Method for creating a fully self-aligned via202010,622,221Methods of etching metal oxides with less etch residue202010,620,263System and method for fault isolation by emission spectra analysis202010,600,688Methods of producing self-aligned vias202010,593,594Selectively etched self-aligned via processes202010,573,555Methods of producing self-aligned grown via202010,553,485Methods of producing fully self-aligned vias and contacts202010,522,404Fully self-aligned via201910,424,507Fully self-aligned via201910,410,921Fully self-aligned via201910,269,647Self-aligned EPI contact flow201910,041,997System and method for fault isolation by emission spectra analysis20188,089,051'Electron reflector with multiple reflective modes'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012Patents assigned to FREED REGINA (1)· patent assignee history
2012Patents assigned to GRELLA LUCA (1)· patent assignee history
2012Based in Mountain View, CA, US· patent location history
2018–2020Patents assigned to FEI EFA INC (2)· patent assignee history
2018–2021Based in Los Altos, CA, US· patent location history
2019–2021Patents assigned to MICROMATERIALS LLC (13)· patent assignee history
2019–2021Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2020Based in Santa Clara, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICROMATERIALS LLC | 13 | 2019–2021 |
| APPLIED MATERIALS INC | 4 | 2019–2021 |
| FEI EFA INC | 2 | 2018–2020 |
| FREED REGINAself | 1 | 2012 |
| GRELLA LUCA | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Los Altos, California, US | 18 | 2018–2021 |
| Santa Clara, California, US | 1 | 2020 |
| Mountain View, California, US | 1 | 2012 |