Inventor
Keiki Ito
Inventor
Nirasaki, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01JElectric discharge tubes or discharge lamps18%
Y10TTechnical subjects covered by former us classification18%
C23CCoating metallic material11%
G05DSystems for controlling or regulating non-electric variables11%
F17DPipe-line systems7%
H01FMagnets4%
H01LSemiconductor devices4%
H03HImpedance networks, e.g. resonant circuits4%
H05HPlasma technique4%
PatentTitleYear
10,074,519Plasma processing apparatus and filter unit201810,056,230Power supply system, plasma processing apparatus and power supply control method20189,441,791'Gas supply unit, substrate processing apparatus and supply gas setting method'20168,906,193'Gas supply unit, substrate processing apparatus and supply gas setting method'20148,109,288'Flow rate control system and shower plate used for partial pressure control system'20127,481,240'Partial pressure control system, flow rate control system and shower plate used for partial pressure control system'20097,353,841'Relative pressure control system and relative flow control system'20085,554,249'Magnetron plasma processing system'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2018Patents assigned to TOKYO ELECTRON LTD (8)· patent assignee history
1996–2016Based in Nirasaki, JP· patent location history
2008Patents assigned to CKD CORP (1)· patent assignee history
2009–2012Based in Yamanashi, JP· patent location history
2012–2014Patents assigned to ITO KEIKI (2)· patent assignee history
2012Patents assigned to ENDO HIROKI (1)· patent assignee history
2012Patents assigned to HAYASHI DAISUKE (1)· patent assignee history
2018Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 8 | 1996–2018 |
| ITO KEIKIself | 2 | 2012–2014 |
| CKD CORP | 1 | 2008 |
| ENDO HIROKI | 1 | 2012 |
| HAYASHI DAISUKE | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 4 | 1996–2016 |
| Miyagi, JP | 2 | 2018 |
| Yamanashi, JP | 2 | 2009–2012 |