Inventor

Tadao Akamine

Inventor

Tokyo, JP

Overview

12→

Patents

1992–2011

Patent span

Electricity

Primary field (CPC H)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%

H10DInorganic electric semiconductor devices19%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%

B41JTypewriters3%

G09GArrangements or circuits for control of indicating devices using static means to present variable information3%

H04NPictorial communication, e.g. television3%

H05BElectric heating3%

PatentTitleYear

7,868,907'Thermal head driving IC and method of controlling the same'2011 6,469,405'Constant-current output driver with reduced over-shoot'2002 5,925,574'Method of producing a bipolar transistor'1999 5,874,352'Method of producing MIS transistors having a gate electrode of matched conductivity type'1999 5,763,903'Avalanche photodiode for light detection'1998 5,753,530'Impurity doping method with diffusion source of boron-silicide film'1998 5,744,850'Photoelectric conversion semiconductor device'1998 5,719,414'Photoelectric conversion semiconductor device with insulation film'1998 5,532,185'Impurity doping method with adsorbed diffusion source'1996 5,514,620'Method of producing PN junction device'1996 5,338,697'Doping method of barrier region in semiconductor device'1994 5,124,272'Method of producing field effect transistor'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2011Patents assigned to SEIKO INSTR INC (9)· patent assignee history

1992–1999Based in Tokyo, JP· patent location history

1998Patents assigned to SEIKO INSTR R & D CENTER INC (1)· patent assignee history

1998–2011Based in Chiba, JP· patent location history

1999Patents assigned to SIEKO INSTR INC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SEIKO INSTR INC	9	1992–2011
SEIKO INSTR R & D CENTER INC	1	1998
SIEKO INSTR INC	1	1999

Locations

Location	Patents	Span
Tokyo, JP	8	1992–1999
Chiba, JP	4	1998–2011