Inventor
David Nan-Chou Liu
Inventor
Chutung, TW
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps78%
C25DProcesses for the electrolytic or electrophoretic production of coatings4%
G02BOptical elements, systems or apparatus4%
H01LSemiconductor devices4%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y10TTechnical subjects covered by former us classification4%
PatentTitleYear
10,944,005Interfacial layer between fin and source/drain region20219,031,362'Controlled inter-mode cross-talk in optical waveguides'20155,969,473'Two-part field emission structure'19995,894,194'Invisible spacers for field emission displays'19995,880,554'Soft luminescence of field emission display'19995,869,928'Method of manufacturing a flat panel field emission display having auto gettering'19995,849,442'Method of manufacturing a flat panel field emission display having auto gettering'19985,808,400'Field emission display with improved viewing Characteristics'19985,783,904'High luminescence display'19985,762,527'High luminescence display'19985,735,722'High luminescence display'19985,733,161'High luminescence display'19985,723,052'Soft luminescence of field emission display'19985,720,640'Invisible spacers for field emission displays'19985,702,281'Fabrication of two-part emitter for gated field emission device'19975,693,438'Method of manufacturing a flat panel field emission display having auto gettering'19975,676,578'Soft luminescence of field emission display'19975,655,941'High luminescence display'19975,635,048'Method for forming low-energy electron excited fluorescent screen'19975,509,839'Soft luminescence of field emission display'19965,509,840'Fabrication of high aspect ratio spacers for field emission display'19965,394,006'Narrow gate opening manufacturing of gated fluid emitters'19955,378,182'Self-aligned process for gated field emitters'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–1999Patents assigned to IND TECH RES INST (21)· patent assignee history
1995–1999Based in Jhubei City, TW· patent location history
1996–1999Based in Chutung, TW· patent location history
1997–1999Based in Kwai Fong, Hong Kong, CN· patent location history
2015Patents assigned to MASSACHUSETTS INST TECHNOLOGY (1)· patent assignee history
2015Patents assigned to UNIV CORNELL (1)· patent assignee history
2015Based in Cambridge, MA, US· patent location history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history
2021Based in Tainan, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IND TECH RES INST | 21 | 1995–1999 |
| MASSACHUSETTS INST TECHNOLOGY | 1 | 2015 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 1 | 2021 |
| UNIV CORNELL | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chutung, TW | 12 | 1996–1999 |
| Jhubei City, TW | 5 | 1995–1999 |
| Kwai Fong, Hong Kong, CN | 2 | 1997–1999 |
| Tainan, TW | 1 | 2021 |
| Cambridge, Massachusetts, US | 1 | 2015 |