Inventor
Bastian Marten Noller
Inventor
Lorsch, DE
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Gprimary
C09GPolishing compositions24%
C09KMaterials for miscellaneous applications, not provided for elsewhere24%
H01LSemiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
C23FNon-mechanical removal of metallic material from surface3%
PatentTitleYear
10,407,594Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine201910,227,506Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium201910,214,663Chemical-mechanical polishing composition comprising organic/inorganic composite particles20199,777,192'Chemical mechanical polishing (CMP) composition comprising a protein'20179,524,874'Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films'20169,443,739'Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound'20169,416,298'Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant'20169,263,296'Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2019Patents assigned to BASF SE (8)· patent assignee history
2016–2019Patents assigned to LI YUZHUO (3)· patent assignee history
2016–2019Patents assigned to NOLLER BASTIAN MARTEN (3)· patent assignee history
2016–2019Patents assigned to FRANZ DIANA (2)· patent assignee history
2016–2019Patents assigned to LAUTER MICHAEL (2)· patent assignee history
2016–2019Based in Lorsch, DE· patent location history
2019Based in Neuhofen, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BASF SE | 8 | 2016–2019 |
| LI YUZHUO | 3 | 2016–2019 |
| NOLLER BASTIAN MARTENself | 3 | 2016–2019 |
| FRANZ DIANA | 2 | 2016–2019 |
| LAUTER MICHAEL | 2 | 2016–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lorsch, DE | 6 | 2016–2019 |
| Neuhofen, DE | 2 | 2019 |