Inventor
John W. Coburn
Inventor
San Jose, CA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
C23FNon-mechanical removal of metallic material from surface15%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
B05DProcesses for applying fluent materials to surfaces, in general8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01JElectric discharge tubes or discharge lamps8%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
7,148,073'Methods and systems for preparing a copper containing substrate for analysis'20066,475,920'Plasma etching method using low ionization potential gas'20026,228,775'Plasma etching method using low ionization potential gas'20014,331,504'Etching process with vibrationally excited SF.sub.6'19824,226,896'Plasma method for forming a metal containing polymer'19804,162,185'Utilizing saturated and unsaturated halocarbon gases in plasma etching to increase etch of SiO.sub.2 relative to Si'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979–1982Patents assigned to IBM (3)· patent assignee history
1979–2006Based in San Jose, CA, US· patent location history
2001–2002Patents assigned to MICRON TECHNOLOGY INC (2)· patent assignee history
2006Patents assigned to KLA TENCOR TECH CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 3 | 1979–1982 |
| MICRON TECHNOLOGY INC | 2 | 2001–2002 |
| KLA TENCOR TECH CORP | 1 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 6 | 1979–2006 |