Inventor
Heinz F. Reinhardt
Inventor
Chadds Ford, PA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing18%
B24DTools for grinding, buffing or sharpening17%
B29CShaping or joining of plastics13%
Y10TTechnical subjects covered by former us classification9%
B29LIndexing scheme associated with subclass b29c, relating to particular articles8%
C08JWorking-up6%
C09KMaterials for miscellaneous applications, not provided for elsewhere6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B01DSeparation3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
8,709,138'Filter medium for particulate filtration'20148,128,729'Filter arrangement'20127,270,762'Polishing compositions for noble metals'20076,903,021'Method of polishing a semiconductor device'20056,899,611'Polishing pad for a semiconductor device having a dissolvable substance'20056,894,620'Method and device for monitoring the service life of a filter'20056,454,633'Polishing pads of flocked hollow fibers and methods relating thereto'20026,439,989'Polymeric polishing pad having continuously regenerated work surface'20026,419,556'Method of polishing using a polishing pad'20026,337,281'Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like'20026,325,703'Polishing pads and methods relating thereto'20016,231,434'Polishing pads and methods relating thereto'20016,106,754'Method of making polishing pads'20006,099,954'Polishing material and method of polishing a surface'20006,095,902'Polyether-polyester polyurethane polishing pads and related methods'20006,069,080'Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like'20006,019,666'Mosaic polishing pads and methods relating thereto'20006,017,265'Methods for using polishing pads'20005,900,164'Method for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelements'19995,578,362'Polymeric polishing pad containing hollow polymeric microelements'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2002Patents assigned to RODEL INC (14)· patent assignee history
1996–2007Based in Chadds Ford, PA, US· patent location history
2005–2014Patents assigned to FREUDENBERG CARL KG (3)· patent assignee history
2005–2007Patents assigned to ROHM & HAAS ELECT MAT (3)· patent assignee history
2005–2014Based in Edingen-Neckarhausen, DE· patent location history
2012–2014Patents assigned to REINHARDT HEINZ (2)· patent assignee history
2014Patents assigned to BADER ROBERT (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RODEL INC | 14 | 1996–2002 |
| FREUDENBERG CARL KG | 3 | 2005–2014 |
| ROHM & HAAS ELECT MAT | 3 | 2005–2007 |
| REINHARDT HEINZself | 2 | 2012–2014 |
| BADER ROBERT | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chadds Ford, Pennsylvania, US | 17 | 1996–2007 |
| Edingen-Neckarhausen, DE | 3 | 2005–2014 |