Inventor
Daniel Nathan Burbank
Inventor
Ridgefield, CT, US
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
10,761,435Reticle clamping device202010,585,359Membrane assembly and particle trap202010,423,081Reticle cooling by non-uniform gas flow201910,031,428Gas flow optimization in reticle stage environment20189,977,351Patterning device support, lithographic apparatus, and method of controlling patterning device temperature20189,910,368'Patterning device manipulating system and lithographic apparatuses'20189,766,557'Patterning device support, lithographic apparatus, and method of controlling patterning device temperature'20179,740,112'Patterning device support and lithographic apparatus'20179,632,434'Reticle cooling system in a lithographic apparatus'20179,632,433'Patterning device support, lithographic apparatus, and method of controlling patterning device temperature'20179,377,700'Determining position and curvature information directly from a surface of a patterning device'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to ASML HOLDING NV (11)· patent assignee history
2016–2020Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2016–2020Based in Ridgefield, CT, US· patent location history
2017–2019Based in Wilton, CT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 11 | 2016–2020 |
| ASML NETHERLANDS BV | 10 | 2016–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ridgefield, CT, US | 6 | 2016–2020 |
| Wilton, CT, US | 5 | 2017–2019 |