Inventor

Tsuyoshi Hanada

Inventor
Tokyo, JP

Overview

19→
Patents
1998–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C11Dprimary
C11DDetergent compositions24%
D05BSewing16%
C07CAcyclic or carbocyclic compounds8%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis8%
B08BCleaning in general5%
C10MLubricating compositions5%
C10NIndexing scheme associated with subclass c10m relating to lubricating compositions5%
D05DIndexing scheme associated with subclasses d05b and d05c, relating to sewing, embroidering and tufting5%
B01DSeparation3%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2020Patents assigned to JUKI KK (7)· patent assignee history
1998–2021Based in Tokyo, JP· patent location history
2002–2010Patents assigned to ASAHI GLASS CO LTD (9)· patent assignee history
2002–2010Based in Ichihara, JP· patent location history
2003–2007Based in Chiba, JP· patent location history
2020Patents assigned to AGC INC (2)· patent assignee history
2020Based in Chiyoda-ku, JP· patent location history
2020Based in Tama, JP· patent location history
2021Patents assigned to MITSUBISHI HEAVY IND LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASAHI GLASS CO LTD92002–2010
JUKI KK71998–2020
AGC INC22020
MITSUBISHI HEAVY IND LTD12021
Locations
LocationPatentsSpan
Tokyo, JP71998–2021
Chiba, JP52003–2007
Ichihara, JP32002–2010
Chiyoda-ku, JP22020
Tama, JP12020