Inventor

Hisayuki Shimizu

Inventor

Niigata, JP

Overview

1984–2021

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%

C04BLime, magnesia17%

G09GArrangements or circuits for control of indicating devices using static means to present variable information8%

Y02WClimate change mitigation technologies related to wastewater treatment or waste management8%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1984–1987Patents assigned to NIPPON KOGAKU KK (2)· patent assignee history

1984–1988Based in Tokyo, JP· patent location history

1987–1989Based in Yokohama, JP· patent location history

1989–1990Patents assigned to DENKI KAGAKU KOGYO KK (2)· patent assignee history

1989Patents assigned to NIKON CORP (1)· patent assignee history

1989–1990Based in Niigata, JP· patent location history

2021Patents assigned to SONY CORP (1)· patent assignee history

2021Based in Yokohama-shi, Kanagawa, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations