Inventor
Ryuichi Asako
Inventor
Nirasaki, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1023%
H01LSemiconductor devices12%
H01JElectric discharge tubes or discharge lamps10%
C23CCoating metallic material8%
C11DDetergent compositions3%
H10DInorganic electric semiconductor devices3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%
B05DProcesses for applying fluent materials to surfaces, in general2%
B08BCleaning in general2%
PatentTitleYear
10,923,332Plasma processing method202110,903,085Method for etching organic region202110,777,425Method of processing substrate202010,734,204Method for cleaning components of plasma processing apparatus202010,626,497Method for cleaning components of plasma processing apparatus202010,304,725Manufacturing methods to protect ULK materials from damage during etch processing to obtain desired features201910,083,859Coating formation method and semiconductor device manufacturing method using the coating formation method20189,892,934'Method for removing halogen and method for manufacturing semiconductor device'20189,780,037'Method of processing target object'20178,614,140'Semiconductor device manufacturing apparatus'20138,357,615'Method of manufacturing semiconductor device'20138,288,252'Method for recovering damaged components in lower region of low dielectric insulating film'20128,268,721'Semiconductor device and semiconductor device manufacturing method'20128,101,507'Semiconductor device manufacturing method and semiconductor device manufacturing apparatus'20128,075,730'Apparatus for manufacturing a semiconductor device'20118,058,153'Method for recovering damage of low dielectric insulating film for manufacturing semiconductor device'20117,902,077'Semiconductor device manufacturing method that recovers damage of the etching target while supplying a predetermined recovery gas'20117,799,703'Processing method and storage medium'20107,521,098'Method of processing an organic-film'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2021Patents assigned to TOKYO ELECTRON LTD (19)· patent assignee history
2009–2019Based in Nirasaki, JP· patent location history
2011–2013Patents assigned to ASAKO RYUICHI (7)· patent assignee history
2011–2012Patents assigned to OHSAWA YUSUKE (2)· patent assignee history
2011–2012Based in Tokyo, JP· patent location history
2012–2013Patents assigned to SHIRAISHI GOUSUKE (2)· patent assignee history
2012–2013Patents assigned to TAHARA SHIGERU (2)· patent assignee history
2012–2017Based in Yamanashi, JP· patent location history
2020–2021Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 19 | 2009–2021 |
| ASAKO RYUICHIself | 7 | 2011–2013 |
| OHSAWA YUSUKE | 2 | 2011–2012 |
| SHIRAISHI GOUSUKE | 2 | 2012–2013 |
| TAHARA SHIGERU | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 8 | 2009–2019 |
| Miyagi, JP | 5 | 2020–2021 |
| Yamanashi, JP | 4 | 2012–2017 |
| Tokyo, JP | 2 | 2011–2012 |