Inventor

Satoshi Terakura

Inventor

Tokyo, JP

Overview

2018

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary

H01LSemiconductor devices25%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%

H01JElectric discharge tubes or discharge lamps13%

H05HPlasma technique13%

H10BElectronic memory devices13%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to HITACHI HIGH TECH CORP (2)· patent assignee history

2018Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI HIGH TECH CORP	2	2018

Locations

Location	Patents	Span
Tokyo, JP	2	2018