Inventor
Valerie A. Ward
Inventor
Meridian, ID, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1043%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests36%
C12NMicroorganisms or enzymes7%
C12PFermentation or enzyme-using processes to synthesise a desired chemical compound or composition or to separate optical isomers from a racemic mixture7%
C12YEnzymes7%
PatentTitleYear
11,034,980Microbial engineering for the production of isoprenoids20216,555,896'Etch stop for use in etching of silicon oxide'20036,232,218'Etch stop for use in etching of silicon oxide'20016,222,257'Etch stop for use in etching of silicon oxide'20016,013,943'Etch stop for use in etching of silicon oxide'20006,004,875'Etch stop for use in etching of silicon oxide'19995,449,314'Method of chimical mechanical polishing for dielectric layers'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2003Patents assigned to MICRON TECHNOLOGY INC (6)· patent assignee history
1995Based in Boise, ID, US· patent location history
1999–2003Based in Meridian, ID, US· patent location history
2021Patents assigned to MASSACHUSETTS INST TECHNOLOGY (1)· patent assignee history
2021Based in Kitchener, CA· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 6 | 1995–2003 |
| MASSACHUSETTS INST TECHNOLOGY | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Meridian, ID, US | 5 | 1999–2003 |
| Kitchener, CA | 1 | 2021 |
| Boise, ID, US | 1 | 1995 |