Inventor
Hans-Juergen Rostalski
Inventor
Oberkochen, DE
Overview
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices49%
G02BOptical elements, systems or apparatus43%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
G01NInvestigating or analysing materials by determining their chemical or physical properties1%
PatentTitleYear
11,119,413Imaging optical unit for imaging an object field into an image field202110,527,832Imaging optical unit and projection exposure apparatus including same202010,330,903Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit201910,254,653Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit201910,139,734Imaging optical unit and projection exposure apparatus for projection lithography, having such imaging optical unit201810,101,668Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same20189,709,494'Measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography'20179,291,751'Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit'20169,086,561'Optical arrangement in a projection objective of a microlithographic projection exposure apparatus'20159,057,964'Imaging optics and projection exposure installation for microlithography with an imaging optics'20158,605,257'Projection system with compensation of intensity variations and compensation element therefor'20138,451,458'Imaging microoptics for measuring the position of an aerial image'20138,345,350'Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same'20138,164,759'Imaging microoptics for measuring the position of an aerial image'20128,068,276'Projection objective for lithography'20117,969,663'Projection objective for immersion lithography'20117,965,453'Projection objective and projection exposure apparatus including the same'20117,834,981'Projection exposure apparatus, projection exposure method and projection objective'20107,835,073'Projection objective for lithography'20107,751,129'Refractive projection objective for immersion lithography'20107,738,188'Projection objective and projection exposure apparatus including the same'20107,570,343'Microlithographic projection exposure apparatus'20097,551,361'Lithography lens system and projection exposure system provided with at least one lithography lens system of this type'20097,532,306'Microlithographic projection exposure apparatus'20097,492,509'Projection optical system'20097,411,201'Projection objective for a microlithographic projection exposure apparatus'20087,408,716'Refractive projection objective for immersion lithography'20087,382,540'Refractive projection objective'20087,312,847'Refractive projection objective for immersion lithography'20077,277,231'Projection objective of a microlithographic exposure apparatus'20077,190,527'Refractive projection objective'20077,187,503'Refractive projection objective for immersion lithography'20076,906,866'Compact 1½-waist system for sub 100 nm ArF lithography'20056,891,596'Refractive projection objective for immersion lithography'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2010Patents assigned to ZEISS CARL SMT AG (17)· patent assignee history
2005–2021Based in Oberkochen, DE· patent location history
2005–2008Based in Berlin, DE· patent location history
2009–2011Based in Aalen, DE· patent location history
2011–2021Patents assigned to ZEISS CARL SMT GMBH (17)· patent assignee history
2011–2015Patents assigned to ROSTALSKI HANS-JUERGEN (7)· patent assignee history
2011–2013Patents assigned to FELDMANN HEIKO (5)· patent assignee history
2011–2015Patents assigned to EPPLE ALEXANDER (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT AG | 17 | 2005–2010 |
| ZEISS CARL SMT GMBH | 17 | 2011–2021 |
| ROSTALSKI HANS-JUERGENself | 7 | 2011–2015 |
| FELDMANN HEIKO | 5 | 2011–2013 |
| EPPLE ALEXANDER | 3 | 2011–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oberkochen, DE | 26 | 2005–2021 |
| Aalen, DE | 4 | 2009–2011 |
| Berlin, DE | 4 | 2005–2008 |