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Inventor

Satoshi Biwa

Inventor
Kumamoto, JP

Overview

6→
Patents
2014–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
H01LSemiconductor devices29%
B08BCleaning in general18%
F26BDrying solid materials or objects by removing liquid therefrom6%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
PatentTitleYear
10,679,845Substrate processing apparatus having cooling member202010,619,922Substrate processing apparatus, substrate processing method, and storage medium202010,593,571Substrate processing apparatus202010,381,246Substrate processing apparatus201910,276,425Substrate processing system20198,671,875'Liquid processing apparatus, liquid processing method and storage medium'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2020Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2014Patents assigned to BIWA SATOSHI (1)· patent assignee history
2014Patents assigned to FUJIMURA KOUJI (1)· patent assignee history
2014Patents assigned to KISHITA NAOFUMI (1)· patent assignee history
2014Patents assigned to NAGAMINE SHUICHI (1)· patent assignee history
2014Based in Koshi, JP· patent location history
2019–2020Based in Kumamoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD62014–2020
BIWA SATOSHIself12014
FUJIMURA KOUJI12014
KISHITA NAOFUMI12014
NAGAMINE SHUICHI12014
Locations
LocationPatentsSpan
Kumamoto, JP52019–2020
Koshi, JP12014