Inventor
Hwachol Lee
Inventor
Daejeon, KR
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Cprimary
G11CStatic stores15%
H01FMagnets15%
H01LSemiconductor devices15%
H10BElectronic memory devices15%
H10NElectric solid-state devices not otherwise provided for15%
G06FElectric digital data processing8%
H04LTransmission of digital information, e.g. telegraphic communication8%
H04WWireless communication networks8%
PatentTitleYear
11,070,488System and method to control a cross domain workflow based on a hierarchical engine framework202110,395,809Perpendicular magnetic layer and magnetic device including the same20199,842,636'Perpendicular magnetization film, perpendicular magnetization film structure, magnetoresistance element, and perpendicular magnetic recording medium'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2019Patents assigned to NAT INST MATERIALS SCIENCE (2)· patent assignee history
2017–2019Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2017Based in Ibaraki, JP· patent location history
2019Based in Tsukuba, JP· patent location history
2021Patents assigned to ELECTRONICS & TELECOMMUNICATIONS RES INST (1)· patent assignee history
2021Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NAT INST MATERIALS SCIENCE | 2 | 2017–2019 |
| SAMSUNG ELECTRONICS CO LTD | 2 | 2017–2019 |
| ELECTRONICS & TELECOMMUNICATIONS RES INST | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 1 | 2021 |
| Tsukuba, JP | 1 | 2019 |
| Ibaraki, JP | 1 | 2017 |