Inventor
Laurentius Johannes Adrianus Van Bokhoven
Inventor
Veldhoven, NL
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
10,705,438Lithographic method202010,642,166Patterning device cooling apparatus202010,571,814Lithographic method202010,423,081Reticle cooling by non-uniform gas flow201910,394,139Patterning device cooling apparatus201910,281,830Patterning device cooling systems in a lithographic apparatus201910,222,713Patterning device cooling apparatus201910,095,129Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus201810,031,428Gas flow optimization in reticle stage environment20189,939,740Lithographic apparatus and device manufacturing method20189,625,828'Fluid handling structure, lithographic apparatus and device manufacturing method'20178,848,164'Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method'20148,755,026'Lithographic apparatus and a device manufacturing method'20148,730,448'Lithographic apparatus and device manufacturing method'20148,553,206'Lithographic apparatus, coverplate and device manufacturing method'20138,405,819'Immersion lithographic apparatus and device manufacturing method'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2020Patents assigned to ASML NETHERLANDS BV (16)· patent assignee history
2013–2017Patents assigned to TEN KATE NICOLAAS (6)· patent assignee history
2013–2017Patents assigned to VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS (6)· patent assignee history
2013–2014Patents assigned to CASTELIJNS HENRICUS JOZEF (3)· patent assignee history
2013–2020Based in Veldhoven, NL· patent location history
2018–2020Patents assigned to ASML HOLDING NV (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 16 | 2013–2020 |
| TEN KATE NICOLAAS | 6 | 2013–2017 |
| VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUSself | 6 | 2013–2017 |
| ASML HOLDING NV | 5 | 2018–2020 |
| CASTELIJNS HENRICUS JOZEF | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 16 | 2013–2020 |