Inventor
Joeri Lof
Inventor
Eindhoven, NL
Overview
Patents· 90 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices77%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
B82YSpecific uses or applications of nanostructures3%
H01JElectric discharge tubes or discharge lamps3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
G02BOptical elements, systems or apparatus2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry1%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors1%
C40BCombinatorial chemistry1%
PatentTitleYear
11,022,903Method for temperature control of a component202110,962,891Lithographic apparatus and device manufacturing method202110,788,755Lithographic apparatus and device manufacturing method202010,678,139Lithographic apparatus and device manufacturing method202010,656,538Lithographic apparatus and device manufacturing method202010,620,545Lithographic apparatus and device manufacturing method202010,503,084Lithographic apparatus and device manufacturing method201910,466,595Lithographic apparatus and device manufacturing method201910,372,045Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator201910,345,723Substrate handling system and lithographic apparatus201910,261,428Lithographic apparatus and device manufacturing method201910,222,706Lithographic apparatus and device manufacturing method201910,191,389Lithographic apparatus and device manufacturing method201910,180,629Lithographic apparatus and device manufacturing method201910,151,989Lithographic apparatus and device manufacturing method201810,007,197Sensor system, substrate handling system and lithographic apparatus20189,885,965'Lithographic apparatus and device manufacturing method'20189,798,246'Lithographic apparatus and device manufacturing method'20179,740,107'Lithographic apparatus and device manufacturing method'20179,733,575'Lithographic apparatus and device manufacturing method'20179,588,442'Lithographic apparatus and device manufacturing method'20179,541,843'Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid'20179,482,966'Lithographic apparatus and device manufacturing method'20169,477,160'Lithographic apparatus and device manufacturing method'20169,383,655'Lithographic apparatus and device manufacturing method'20169,366,972'Lithographic apparatus and device manufacturing method'20169,360,765'Lithographic apparatus and device manufacturing method'20169,329,500'Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor'20169,269,531'Backscatter reduction in thin electron detectors'20169,195,153'Lithographic apparatus and device manufacturing method'20159,152,058'Lithographic apparatus and device manufacturing method involving a member and a fluid opening'20159,097,987'Lithographic apparatus and device manufacturing method'20159,091,940'Lithographic apparatus and method involving a fluid inlet and a fluid outlet'20159,081,299'Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap'20159,057,967'Lithographic apparatus and device manufacturing method'20158,975,599'Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus'20158,964,164'Lithographic apparatus and device manufacturing method'20158,913,223'Lithographic apparatus and device manufacturing method'20148,823,920'Lithographic apparatus and device manufacturing method'20148,797,503'Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure'20148,724,084'Lithographic apparatus and device manufacturing method'20148,724,083'Lithographic apparatus and device manufacturing method'20148,711,323'Lithographic apparatus and device manufacturing method'20148,618,498'Backscatter reduction in thin electron detectors'20138,558,989'Lithographic apparatus and device manufacturing method'20138,492,715'Method of protecting a radiation detector in a charged particle instrument'20138,482,845'Lithographic apparatus and device manufacturing method'20138,472,002'Lithographic apparatus and device manufacturing method'20138,446,568'Lithographic apparatus and device manufacturing method'20138,344,341'Lithographic apparatus and device manufacturing method'20138,208,120'Lithographic apparatus and device manufacturing method'20128,154,708'Lithographic apparatus and device manufacturing method'20127,982,850'Immersion lithographic apparatus and device manufacturing method with gas supply'20117,936,444'Lithographic apparatus and device manufacturing method'20117,931,844'Imprint lithography'20117,932,999'Lithographic apparatus and device manufacturing method'20117,808,613'Individual wafer history storage for overlay corrections'20107,795,603'Lithographic apparatus and device manufacturing method'20107,738,074'Lithographic apparatus and device manufacturing method'20107,593,092'Lithographic apparatus and device manufacturing method'20097,593,093'Lithographic apparatus and device manufacturing method'20097,482,611'Lithographic apparatus and device manufacturing method'20097,442,029'Imprint lithography'20087,420,676'Alignment method, method of measuring front to backside alignment error, method of detecting non-orthogonality, method of calibration, and lithographic apparatus'20087,388,648'Lithographic projection apparatus'20087,375,795'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20087,372,541'Lithographic apparatus and device manufacturing method'20087,359,030'Lithographic apparatus and device manufacturing method'20087,352,434'Lithographic apparatus and device manufacturing method'20087,292,339'Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool'20077,274,029'Lithographic apparatus and device manufacturing method'20077,253,881'Methods and systems for lithographic gray scaling'20077,239,393'Calibration method for a lithographic apparatus and device manufacturing method'20077,233,384'Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor'20077,224,436'Lithographic apparatus and device manufacturing method'20077,213,963'Lithographic apparatus and device manufacturing method'20077,199,858'Lithographic apparatus and device manufacturing method'20077,197,828'Lithographic apparatus and device manufacturing method utilizing FPD chuck Z position measurement'20077,193,232'Lithographic apparatus and device manufacturing method with substrate measurement not through liquid'20077,193,231'Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby'20077,116,404'Lithographic apparatus and device manufacturing method'20067,113,258'Lithographic apparatus'20067,110,081'Lithographic apparatus and device manufacturing method'20067,081,943'Lithographic apparatus and device manufacturing method'20067,075,616'Lithographic apparatus and device manufacturing method'20067,057,702'Lithographic apparatus and device manufacturing method'20067,038,760'Lithographic apparatus and device manufacturing method'20066,952,253'Lithographic apparatus and device manufacturing method'20056,936,385'Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods'20056,822,730'Substrate holder and device manufacturing method'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2021Patents assigned to ASML NETHERLANDS BV (86)· patent assignee history
2004–2021Based in Eindhoven, NL· patent location history
2012–2017Patents assigned to LOF JOERI (24)· patent assignee history
2012–2017Patents assigned to LOOPSTRA ERIK ROELOF (19)· patent assignee history
2012–2017Patents assigned to SIMON KLAUS (19)· patent assignee history
2012–2017Patents assigned to STRAAIJER ALEXANDER (18)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 86 | 2004–2021 |
| LOF JOERIself | 24 | 2012–2017 |
| LOOPSTRA ERIK ROELOF | 19 | 2012–2017 |
| SIMON KLAUS | 19 | 2012–2017 |
| STRAAIJER ALEXANDER | 18 | 2012–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 90 | 2004–2021 |