Inventor
Hiroshi Ban
Inventor
Toyota, JP
Overview
21→
Patents
1978–2017
Patent span
General tagging of new technological developments
Primary field (CPC Y)
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
Y10Sprimary
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
Y10TTechnical subjects covered by former us classification16%
E05BLocks11%
F16DCouplings for transmitting rotation11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
B60KArrangement or mounting of propulsion units or of transmissions in vehicles5%
H10DInorganic electric semiconductor devices5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
PatentTitleYear
9,567,779'Lid lock apparatus for vehicle'20179,228,381'Lid lock apparatus for vehicle'20168,305,102'Probe card, method for manufacturing probe card, and prober apparatus'20126,951,355'Door lock system for vehicle'20056,945,574'Door lock system for vehicle'20056,759,722'Semiconductor device and method of manufacturing the same'20046,575,506'Door lock system for vehicle'20036,545,371'Semiconductor device wherein detection of removal of wiring triggers impairing of normal operation of internal circuit'20036,492,446'Alatex compound for dip molding and a dip-molded product'20026,472,730'Semiconductor device and method of manufacturing the same'20026,060,773'Semiconductor chip and method of manufacturing the same'20005,512,417'Positive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitor'19965,457,003'Negative working resist material, method for the production of the same and process of forming resist patterns using the same'19955,393,664'Method of preparing (S)-1-phenyl-1,3-propanediol or derivatives thereof from their respective ketones'19955,389,492'Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound'19955,356,753'Positive resist material'19944,416,361'Friction facings reinforced with stitching'19834,262,788'Friction member of non-asbestos'19814,241,820'Clutch assembly'19804,220,233'Clutch assembly for use with an internal combustion engine'19804,095,683'Diaphragm spring clutch'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–2017Patents assigned to AISIN SEIKI (9)· patent assignee history
1978–1983Based in Toyota, JP· patent location history
1981–2016Patents assigned to BAN HIROSHI (3)· patent assignee history
1994–2004Patents assigned to NIPPON TELEGRAPH & TELEPHONE (8)· patent assignee history
1994–1996Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history
1994–2012Based in Kanagawa, JP· patent location history
1996–2004Based in Machida, JP· patent location history
2002–2004Patents assigned to SHARP KK (3)· patent assignee history
2003–2016Based in Kariya, JP· patent location history
2017Based in Chiryu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AISIN SEIKI | 9 | 1978–2017 |
| NIPPON TELEGRAPH & TELEPHONE | 8 | 1994–2004 |
| BAN HIROSHIself | 3 | 1981–2016 |
| SHARP KK | 3 | 2002–2004 |
| SHINETSU CHEMICAL CO | 2 | 1994–1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyota, JP | 5 | 1978–1983 |
| Kariya, JP | 4 | 2003–2016 |
| Machida, JP | 4 | 1996–2004 |
| Kanagawa, JP | 3 | 1994–2012 |
| Chiryu, JP | 1 | 2017 |