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Inventor

Eric Anthony Robertson, III

Inventor
Easton, PA, US

Overview

2→
Patents
2000–2003
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
B81BMicrostructural devices or systems, e.g. micromechanical devices20%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems20%
C23FNon-mechanical removal of metallic material from surface20%
PatentTitleYear
6,534,413'Method to remove metal and silicon oxide during gas-phase sacrificial oxide etch'20036,159,859'Gas phase removal of SiO.sub.2 /metals from silicon'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to AIR PROD & CHEM (2)· patent assignee history
2000–2003Based in Easton, PA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
AIR PROD & CHEM22000–2003
Locations
LocationPatentsSpan
Easton, Pennsylvania, US22000–2003