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Inventor

Istvan Barsony

Inventor
Budapest, HU

Overview

3→
Patents
1987–2012
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B81Bprimary
B81BMicrostructural devices or systems, e.g. micromechanical devices17%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems17%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure17%
H10DInorganic electric semiconductor devices17%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation17%
Y10TTechnical subjects covered by former us classification17%
PatentTitleYear
8,115,240'CMOS integrated process for fabricating monocrystalline silicon micromechanical elements by porous silicon micromachining'20124,791,396'Color image sensor'19884,679,307'Method of manufacturing a recessed gate of a semiconductor device'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987Patents assigned to JAPAN RES DEV CORP (1)· patent assignee history
1987Based in Hamamatsu, JP· patent location history
1988Based in Hamamatu, JP· patent location history
2012Patents assigned to ADAM ANTALNE (1)· patent assignee history
2012Patents assigned to BARSONY ISTVAN (1)· patent assignee history
2012Patents assigned to DUCSO CSABA (1)· patent assignee history
2012Patents assigned to EROS MAGDOLNA (1)· patent assignee history
2012Based in Budapest, HU· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADAM ANTALNE12012
BARSONY ISTVANself12012
DUCSO CSABA12012
EROS MAGDOLNA12012
JAPAN RES DEV CORP11987
Locations
LocationPatentsSpan
Budapest, HU12012
Hamamatu, JP11988
Hamamatsu, JP11987