Inventor

Dai Inoue

Inventor

Ibaraki, JP

Overview

2006–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C03Bprimary

C03BManufacture, shaping, or supplementary processes35%

Y02PClimate change mitigation technologies in the production or processing of goods19%

G02BOptical elements, systems or apparatus15%

C03CChemical composition of glasses, glazes or vitreous enamels4%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%

C08LCompositions of macromolecular compounds4%

C09DCoating compositions, e.g. paints, varnishes or lacquers4%

F17CVessels for containing or storing compressed, liquefied or solidified gases4%

H01BCables4%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution4%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2006–2019Patents assigned to SHINETSU CHEMICAL CO (11)· patent assignee history

2006Based in Annaka, JP· patent location history

2009–2010Based in Gunma, JP· patent location history

2013–2019Patents assigned to INOUE DAI (6)· patent assignee history

2013–2019Patents assigned to KOIDE HIROYUKI (4)· patent assignee history

2013–2019Patents assigned to NAGAO TAKAAKI (4)· patent assignee history

2013–2019Based in Ibaraki, JP· patent location history

2021Patents assigned to JAPAN SCIENCE & TECH AGENCY (1)· patent assignee history

2021Based in Wako, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations