Inventor
Atsushi Onishi
Inventor
Tsukuba, JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B01Dprimary
B01DSeparation16%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry16%
C07BGeneral methods of organic chemistry9%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
H01JElectric discharge tubes or discharge lamps9%
G06TImage data processing or generation, in general7%
C07DHeterocyclic compounds5%
G01RMeasuring electric variables5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
A23LFoods, foodstuffs or non-alcoholic beverages, not otherwise provided for2%
PatentTitleYear
10,943,048Defect inspection apparatus and defect inspection method202110,750,767Non-fried potato chips202010,546,374SEM inspection apparatus and pattern matching method202010,138,454Culture container20188,092,677'Separating agent for an enantiomeric isomer'20128,036,445'Pattern matching method, program and semiconductor device manufacturing method'20117,749,389'Filler used for separating optical isomers and process for separating optical isomers with the filler'20107,674,570'Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device'20107,645,988'Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus'20107,608,821'Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method'20097,550,596'Method of producing ethyl (3R, 5S, 6E)-7-[2 cyclopropyl-4-(fluorophenyl) quinoline-3-yl]-3, 5-dihydroxy-6-heptenoate'20097,512,501'Defect inspecting apparatus for semiconductor wafer'20097,407,576'Separating agent for an optical enantiomeric isomer'20087,399,409'Packing material for separation of optical isomer and method of separating optical isomer with the same'20087,352,195'Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus'20087,258,794'Process for producing packing for resolving optical isomers'20077,212,017'Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus'20077,148,479'Defect inspection apparatus, program, and manufacturing method of semiconductor device'20066,991,729'Optical isomer separating filler, production method therefor and application method therefor'20066,946,557'Process for producing optically active ethyl (3R, 5S, 6E)-7-[2-cycloproply-4-(4-fluorophenyl)quinolin-3-yl]-3,5-dihydroxy-6-heptenoate'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2009Patents assigned to NISSAN CHEMICAL IND LTD (2)· patent assignee history
2006–2011Patents assigned to TOSHIBA KK (8)· patent assignee history
2006–2012Patents assigned to DAICEL CHEM (7)· patent assignee history
2006–2012Based in Tsukuba, JP· patent location history
2006–2010Based in Kanagawa, JP· patent location history
2008Patents assigned to EBARA CORP (1)· patent assignee history
2008–2010Based in Ibaraki, JP· patent location history
2009–2011Based in Yokohama, JP· patent location history
2020–2021Patents assigned to TOSHIBA MEMORY CORP (2)· patent assignee history
2020–2021Based in Nagoya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 8 | 2006–2011 |
| DAICEL CHEM | 7 | 2006–2012 |
| NISSAN CHEMICAL IND LTD | 2 | 2005–2009 |
| TOSHIBA MEMORY CORP | 2 | 2020–2021 |
| EBARA CORP | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tsukuba, JP | 5 | 2006–2012 |
| Kanagawa, JP | 4 | 2006–2010 |
| Yokohama, JP | 3 | 2009–2011 |
| Nagoya, JP | 2 | 2020–2021 |
| Ibaraki, JP | 2 | 2008–2010 |