Inventor

Yasuaki Fukuda

Inventor

Hadano, JP

Overview

29→

Patents

1982–2010

Patent span

Physics

Primary field (CPC G)

Patents· 29 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%

G21KHandling of particles or ionising radiation not otherwise provided for19%

B82YSpecific uses or applications of nanostructures12%

G02BOptical elements, systems or apparatus8%

B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

Y10TTechnical subjects covered by former us classification3%

A61KPreparations for medical, dental or toiletry purposes2%

A61QSpecific use of cosmetics or similar toiletry preparations2%

B08BCleaning in general2%

PatentTitleYear

7,657,219'Image forming apparatus'2010 6,819,396'Exposure apparatus, and device manufacturing method'2004 6,167,111'Exposure apparatus for synchrotron radiation lithography'2000 5,808,312'System and process for inspecting and repairing an original'1998 5,751,780'X-ray mask structure, preparation thereof and X-ray exposure method'1998 5,656,398'Method of making X-ray mask structure'1997 5,607,733'Process for preparing an X-ray mask structure'1997 5,606,586'X-ray exposure method and apparatus and device manufacturing method'1997 5,528,654'Multilayer film for X-rays'1996 5,469,489'Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure'1995 5,433,988'Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray'1995 5,390,228'Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices'1995 5,356,686'X-ray mask structure'1994 5,335,259'X-ray exposure apparatus'1994 5,333,167'Mask structure for x-ray exposure and x-ray exposure device and method using it'1994 5,310,603'Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray'1994 5,262,257'Mask for lithography'1993 5,204,887'X-ray microscope'1993 5,182,763'Reflection device'1993 5,159,621'X-ray transmitting window and method of mounting the same'1992 5,153,898'X-ray reduction projection exposure system of reflection type'1992 5,145,649'Apparatus for cleaning an optical element for use with a radiation beam'1992 5,123,036'X-Ray exposure apparatus'1992 5,101,420'X-ray mask support and process for preparation thereof'1992 5,052,033'Reflection type mask'1991 5,048,066'X-ray exposure process for preventing electrostatic attraction or contact of X-ray masks'1991 5,042,945'Lithographic mask structure and device for positioning the same'1991 5,012,500'X-ray mask support member, X-ray mask, and X-ray exposure process using the X-ray mask'1991 4,361,581'Skin-beautifying cosmetic composition'1982

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1982Patents assigned to FUKUDA YASUAKI (1)· patent assignee history

1991–2004Patents assigned to CANON KK (27)· patent assignee history

1991–1998Based in Hadano, JP· patent location history

1992–1995Based in Machida, JP· patent location history

1992Based in Hatano, JP· patent location history

1998–2004Based in Utsunomiya, JP· patent location history

2010Patents assigned to SHARP KK (1)· patent assignee history

2010Based in Nara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	27	1991–2004
FUKUDA YASUAKIself	1	1982
SHARP KK	1	2010

Locations

Location	Patents	Span
Hadano, JP	20	1991–1998
Utsunomiya, JP	3	1998–2004
Machida, JP	3	1992–1995
Nara, JP	1	2010
Hatano, JP	1	1992