Inventor
YUICHI FURUYA
Inventor
JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01JElectric discharge tubes or discharge lamps8%
H01LSemiconductor devices8%
B01DSeparation4%
F16KValves4%
G05DSystems for controlling or regulating non-electric variables4%
PatentTitleYear
12,571,104Source gas supply method, source gas supply mechanism, and film forming system202612,400,841Trap device and semiconductor manufacturing device202512,392,033Substrate processing apparatus and substrate processing method202512,344,930Deposition method and deposition apparatus202511,796,460Absorbance analysis apparatus for DCR gas, absorbance analysis method for DCR gas, and absorbance analysis program recording medium on which program for DCR gas is recorded202311,753,720Film forming apparatus, source supply apparatus, and film forming method202311,466,365Film-forming apparatus202211,441,224Method of controlling substrate processing apparatus, and substrate processing apparatus202211,306,847Valve device, processing apparatus, and control method202211,193,205Source material container2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TOKYO ELECTRON LTD (10)· patent assignee history
2021–2026Based in JP· patent location history
2023Patents assigned to HORIBA STEC CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 10 | 2021–2026 |
| HORIBA STEC CO LTD | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 10 | 2021–2026 |