Inventor

David J. Kubista

Inventor

Nampa, ID, US

Overview

16→

Patents

1995–2013

Patent span

Chemistry

Primary field (CPC C)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material57%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

H10BElectronic memory devices9%

H10DInorganic electric semiconductor devices9%

H01JElectric discharge tubes or discharge lamps4%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

Y10TTechnical subjects covered by former us classification4%

PatentTitleYear

8,518,184'Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD deposition'2013 8,384,192'Methods for forming small-scale capacitor structures'2013 7,906,393'Methods for forming small-scale capacitor structures'2011 7,771,537'Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition'2010 7,647,886'Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers'2010 7,422,635'Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces'2008 7,344,755'Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers'2008 7,279,398'Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces'2007 7,258,892'Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition'2007 7,235,138'Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces'2007 7,056,806'Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces'2006 6,758,911'Apparatus and process of improving atomic layer deposition chamber performance'2004 6,716,284'Apparatus and process of improving atomic layer deposition chamber performance'2004 6,461,436'Apparatus and process of improving atomic layer deposition chamber performance'2002 6,458,714'Method of selective oxidation in semiconductor manufacture'2002 5,409,587'Sputtering with collinator cleaning within the sputtering chamber'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2013Patents assigned to MICRON TECHNOLOGY INC (16)· patent assignee history

1995–2013Based in Nampa, ID, US· patent location history

2013Patents assigned to BASCERI CEM (2)· patent assignee history

2013Patents assigned to BEAMAN KEVIN L (2)· patent assignee history

2013Patents assigned to BREINER LYLE D (2)· patent assignee history

2013Patents assigned to DOAN TRUNG T (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MICRON TECHNOLOGY INC	16	1995–2013
BASCERI CEM	2	2013
BEAMAN KEVIN L	2	2013
BREINER LYLE D	2	2013
DOAN TRUNG T	2	2013

Locations

Location	Patents	Span
Nampa, ID, US	16	1995–2013