Inventor

Hideaki Mitsui

Inventor
Tokyo, JP

Overview

23→
Patents
1999–2013
Patent span
Physics
Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices48%
C23CCoating metallic material17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
C03CChemical composition of glasses, glazes or vitreous enamels4%
H01JElectric discharge tubes or discharge lamps4%
Y10TTechnical subjects covered by former us classification4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds2%
C08LCompositions of macromolecular compounds2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
PatentTitleYear
8,609,304'Method of manufacturing a transfer mask and method of manufacturing a semiconductor device'20138,048,594'Photomask blank, photomask, and methods of manufacturing the same'20118,021,806'Photomask blank, photomask, and methods of manufacturing the same'20118,012,314'Manufacturing method and apparatus of phase shift mask blank'20117,862,963'Halftone type phase shift mask blank and phase shift mask thereof'20117,632,612'Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same'20097,592,106'Halftone type phase shift mask blank and phase shift mask thereof'20097,402,228'Manufacturing method and apparatus of phase shift mask blank'20087,282,121'Manufacturing method and apparatus of phase shift mask blank'20077,169,513'Halftone type phase shift mask blank and phase shift mask thereof'20077,115,341'Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same'20067,060,394'Halftone phase-shift mask blank and halftone phase-shift mask'20067,011,910'Halftone-type phase-shift mask blank, and halftone-type phase-shift mask'20066,844,119'Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask'20056,783,634'Manufacturing method and apparatus of phase shift mask blank'20046,762,000'Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks'20046,723,477'Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask'20046,677,087'Phase shift mask blank, phase shift mask, and method for manufacturing the same'20046,462,130'Polyamide-modified polyolefinic composition and uses thereof'20026,395,434'Phase shift mask and phase shift mask blank'20026,335,124'Phase shift mask and phase shift mask blank'20026,087,047'Phase shift mask and phase shift mask blank'20005,955,223'Phase-shift mask blank and process for the production thereof comprising a semi transparent film with silicon and nitrogen'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2013Patents assigned to HOYA CORP (22)· patent assignee history
1999–2013Based in Tokyo, JP· patent location history
2002Patents assigned to JUJO PAPER CO LTD (1)· patent assignee history
2002Based in Iwakuni, JP· patent location history
2002Based in Tachikawa, JP· patent location history
2004–2011Based in Fuchu, JP· patent location history
2005Patents assigned to DUPONT PHOTOMASKS INC (1)· patent assignee history
2011Based in Shinjuku-ku, JP· patent location history
2013Patents assigned to IWASHITA SATOSHI (1)· patent assignee history
2013Patents assigned to MITSUI HIDEAKI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HOYA CORP221999–2013
DUPONT PHOTOMASKS INC12005
IWASHITA SATOSHI12013
JUJO PAPER CO LTD12002
MITSUI HIDEAKIself12013
Locations
LocationPatentsSpan
Tokyo, JP111999–2013
Fuchu, JP82004–2011
Shinjuku-ku, JP22011
Iwakuni, JP12002
Tachikawa, JP12002