Inventor
Takaaki Matsuoka
Inventor
Tokyo, JP
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
C23CCoating metallic material20%
H01JElectric discharge tubes or discharge lamps14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H10DInorganic electric semiconductor devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
H05HPlasma technique2%
B23KSoldering or unsoldering1%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors1%
F16CShafts1%
PatentTitleYear
10,412,323High-temperature object observation device20199,812,302'Magnetron sputtering apparatus'20179,767,994'Shower plate sintered integrally with gas release hole member and method for manufacturing the same'20179,117,764'Etching method, substrate processing method, pattern forming method, method for manufacturing semiconductor element, and semiconductor element'20158,915,999'Shower plate sintered integrally with gas release hole member and method for manufacturing the same'20148,809,207'Pattern-forming method and method for manufacturing semiconductor device'20148,765,605'Surface treatment for a fluorocarbon film'20148,716,114'Semiconductor device manufacturing method and semiconductor device'20148,573,151'Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window'20138,568,577'Magnetron sputtering apparatus'20138,535,494'Rotary magnet sputtering apparatus'20138,496,792'Rotary magnet sputtering apparatus'20138,497,214'Semiconductor device manufacturing method'20138,486,792'Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device'20138,461,047'Method for processing amorphous carbon film, and semiconductor device manufacturing method using the method'20138,435,882'Film forming method for a semiconductor'20138,399,862'Ion implanting apparatus and ion implanting method'20138,383,194'Film forming apparatus, film forming system, film forming method, and method of manufacturing electronic device or organic electroluminescence element'20138,334,204'Semiconductor device and manufacturing method therefor'20128,278,205'Semiconductor device and method for manufacturing the same'20128,197,913'Film forming method for a semiconductor'20128,124,523'Fabrication method of a semiconductor device and a semiconductor device'20128,021,975'Plasma processing method for forming a film and an electronic component manufactured by the method'20117,923,819'Interlayer insulating film, wiring structure and electronic device and methods of manufacturing the same'20117,874,781'Substrate processing apparatus'20117,803,705'Manufacturing method of semiconductor device and film deposition system'20107,780,391'Substrate processing device'20107,313,931'Method and device for heat treatment'20086,951,815'Method and device for heat treatment'20056,858,115'Process for reforming surface of substrate, reformed substrate and apparatus for the same'20056,285,102'Drive mechanism having a gas bearing operable under a negative pressure environment'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2017Patents assigned to TOKYO ELECTRON LTD (29)· patent assignee history
2005–2019Based in Tokyo, JP· patent location history
2005Based in Aichi, JP· patent location history
2008–2013Based in Minato-ku, JP· patent location history
2011–2014Patents assigned to UNIV TOHOKU NAT UNIV CORP (8)· patent assignee history
2011–2012Based in Miyagi, JP· patent location history
2012–2017Patents assigned to MATSUOKA TAKAAKI (19)· patent assignee history
2013–2017Patents assigned to OHMI TADAHIRO (9)· patent assignee history
2013–2017Patents assigned to GOTO TETSUYA (7)· patent assignee history
2013–2014Based in Sendai, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 29 | 2001–2017 |
| MATSUOKA TAKAAKIself | 19 | 2012–2017 |
| OHMI TADAHIRO | 9 | 2013–2017 |
| UNIV TOHOKU NAT UNIV CORP | 8 | 2011–2014 |
| GOTO TETSUYA | 7 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 18 | 2005–2019 |
| Minato-ku, JP | 5 | 2008–2013 |
| Sendai, JP | 3 | 2013–2014 |
| Miyagi, JP | 3 | 2011–2012 |
| Aichi, JP | 1 | 2005 |