Inventor
Akihiko Yoneda
Inventor
Toyama, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
G05BControl or regulating systems in general25%
H01LSemiconductor devices15%
C23CCoating metallic material10%
G06TImage data processing or generation, in general5%
H01JElectric discharge tubes or discharge lamps5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
10,903,098Substrate processing system and substrate processing apparatus202110,295,991Substrate processing apparatus and recording medium201910,290,516Substrate processing apparatus, maintenance method, and maintenance program20198,600,539'Substrate processing apparatus'20138,482,426'Substrate processing apparatus'20137,808,396'Substrate processing apparatus'20107,494,941'Manufacturing method of semiconductor device, and substrate processing apparatus'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2019Patents assigned to HITACHI INT ELECTRIC INC (6)· patent assignee history
2009–2021Based in Toyama, JP· patent location history
2013Patents assigned to YONEDA AKIHIKO (2)· patent assignee history
2013Patents assigned to IIDA TSUKASA (1)· patent assignee history
2013Patents assigned to INOSHIMA KAORI (1)· patent assignee history
2019–2021Patents assigned to KOKUSAI ELECTRIC CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 6 | 2009–2019 |
| KOKUSAI ELECTRIC CORP | 2 | 2019–2021 |
| YONEDA AKIHIKOself | 2 | 2013 |
| IIDA TSUKASA | 1 | 2013 |
| INOSHIMA KAORI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 7 | 2009–2021 |