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Inventor

WILLIAM J. DURAND

Inventor
US

Overview

4→
Patents
2022–2026
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material30%
B01FMixing, e.g. dissolving, emulsifying or dispersing10%
B82YSpecific uses or applications of nanostructures10%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms10%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
H01LSemiconductor devices10%
H10BElectronic memory devices10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
PatentTitleYear
12,577,663Ampoule for a semiconductor manufacturing precursor202611,753,715Apparatus and methods for controlling concentration of precursors to processing chamber202311,536,708Methods to fabricate dual pore devices202211,393,678Low-k dielectric films2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2022–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC42022–2026
Locations
LocationPatentsSpan
US42022–2026