Inventor
YOSHIRO HIROSE
Inventor
JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01LSemiconductor devices31%
C23CCoating metallic material28%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
H01JElectric discharge tubes or discharge lamps3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
12,571,094Method of processing substrate, substrate processing apparatus, and recording medium202612,392,031Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device202512,381,091Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus202512,315,719Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus202512,037,677Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium202411,978,623Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium202411,848,201Method of manufacturing semiconductor device, recording medium, and substrate processing method202311,699,593Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium202311,527,402Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device202211,380,540Substrate processing apparatus202211,251,038Method of manufacturing semiconductor device, recording medium, and substrate processing method202211,251,039Method of manufacturing semiconductor device, recording medium, and substrate processing method2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to KOKUSAI ELECTRIC CORP (12)· patent assignee history
2022–2026Based in JP· patent location history
2026Patents assigned to AIR WATER INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KOKUSAI ELECTRIC CORP | 12 | 2022–2026 |
| AIR WATER INC | 1 | 2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 12 | 2022–2026 |