Inventor
Johannes Wangler
Inventor
Koenigsbronn, DE
Overview
Patents· 83 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
G02BOptical elements, systems or apparatus21%
B82YSpecific uses or applications of nanostructures12%
G21KHandling of particles or ionising radiation not otherwise provided for12%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
G01BMeasuring length, thickness or similar linear dimensions3%
G01MTesting static or dynamic balance of machines or structures3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G05BControl or regulating systems in general3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
PatentTitleYear
10,599,041Facet mirror202010,146,135Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation201810,018,917Illumination optical unit for EUV projection lithography20189,946,161Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method20189,897,925'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20189,791,784'Assembly for a projection exposure apparatus for EUV projection lithography'20179,575,414'Illumination system for a microlithographic projection exposure apparatus'20179,563,129'Monitor system for determining orientations of mirror elements and EUV lithography system'20179,239,229'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20169,217,930'Illumination system for a microlithographic projection exposure apparatus'20159,019,475'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20159,013,684'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20159,001,309'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20158,891,057'Microlithographic projection exposure apparatus'20148,767,181'Microlithographic exposure method as well as a projection exposure system for carrying out the method'20148,730,455'Illumination system for a microlithographic projection exposure apparatus'20148,724,086'Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation'20148,520,307'Optical integrator for an illumination system of a microlithographic projection exposure apparatus'20138,395,756'Illumination system for a microlithographic projection exposure apparatus'20138,339,577'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20128,294,877'Illumination optical unit for projection lithography'20128,134,687'Illumination system of a microlithographic exposure apparatus'20128,004,656'Illumination system for a microlithographic projection exposure apparatus'20117,977,651'Illumination system particularly for microlithography'20117,880,969'Optical integrator for an illumination system of a microlithographic projection exposure apparatus'2011RE042065'Illumination system particularly for microlithography'20117,847,921'Microlithographic exposure method as well as a projection exposure system for carrying out the method'2010RE041667'Illumination system particularly for microlithography'20107,714,983'Illumination system for a microlithography projection exposure installation'20107,605,386'Optical device with raster elements, and illumination system with the optical device'20097,592,598'Illumination system particularly for microlithography'20097,583,433'Multi mirror system for an illumination system'20097,551,361'Lithography lens system and projection exposure system provided with at least one lithography lens system of this type'20097,542,217'Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus'20097,473,907'Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination'20097,460,212'Collector configured of mirror shells'20087,456,408'Illumination system particularly for microlithography'20087,443,948'Illumination system particularly for microlithography'20087,408,616'Microlithographic exposure method as well as a projection exposure system for carrying out the method'20087,372,634'Reticle-masking objective with aspherical lenses'20087,348,565'Illumination system particularly for microlithography'20087,321,126'Collector with fastening devices for fastening mirror shells'20087,312,462'Illumination system having a nested collector for annular illumination of an exit pupil'20077,244,954'Collector having unused region for illumination systems using a wavelength ≦193 nm'20077,186,983'Illumination system particularly for microlithography'20077,148,495'Illumination system, particularly for EUV lithography'20067,142,285'Illumination system particularly for microlithography'20067,130,129'Reticle-masking objective with aspherical lenses'20067,126,137'Illumination system with field mirrors for producing uniform scanning energy'20067,109,497'Illumination system particularly for microlithography'20067,091,505'Collector with fastening devices for fastening mirror shells'20067,015,489'Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm'20067,006,595'Illumination system particularly for microlithography'20066,964,485'Collector for an illumination system with a wavelength of less than or equal to 193 nm'20056,947,124'Illumination system particularly for microlithography'20056,947,120'Illumination system particularly for microlithography'20056,927,403'Illumination system that suppresses debris from a light source'20056,885,434'Diaphragm for an integrator unit'20056,864,960'Zoom system for an illumination device'20056,859,515'Illumination system, particularly for EUV lithography'20056,858,853'Illumination system particularly for microlithography'20056,859,328'Illumination system particularly for microlithography'20056,840,640'Multi mirror system for an illumination system'20056,836,530'Illumination system with a plurality of individual gratings'20046,733,165'Optical integrator for an illumination device'20046,707,537'Projection exposure system'20046,680,803'Partial objective in an illuminating systems'20046,597,511'Microlithographic illuminating system and microlithographic projection exposure arrangement incorporating said system'20036,583,937'Illuminating system of a microlithographic projection exposure arrangement'20036,445,442'Projection-microlithographic device'20026,438,199'Illumination system particularly for microlithography'20026,400,794'Illumination system, particularly for EUV lithography'20026,366,410'Reticular objective for microlithography-projection exposure installations'20026,295,122'Illumination system and REMA objective with lens displacement and operating process therefor'20016,285,443'Illuminating arrangement for a projection microlithographic apparatus'20016,243,206'Illuminating system for vacuum ultraviolet microlithography'20016,198,793'Illumination system particularly for EUV lithography'20015,982,558'REMA objective for microlithographic projection exposure systems'19995,675,401'Illuminating arrangement including a zoom objective incorporating two axicons'19975,646,715'Illuminating arrangement for an optical system having a reticle masking unit'19975,572,287'Illuminating arrangement for a projection microlithographic exposure apparatus'19965,343,489'Arrangement for shaping a laser beam and for reducing the coherence thereof'19945,041,862'Lens screen'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2003Patents assigned to ZEISS STIFTUNG (15)· patent assignee history
1991–2008Based in Konigsbronn, DE· patent location history
2002–2004Based in Knigsbronn, DE· patent location history
2004–2011Patents assigned to ZEISS CARL SMT AG (37)· patent assignee history
2004–2020Based in Koenigsbronn, DE· patent location history
2004Based in Kōnigsbronn, DE· patent location history
2005–2011Based in Königsbronn, DE· patent location history
2011–2020Patents assigned to ZEISS CARL SMT GMBH (24)· patent assignee history
2012–2015Patents assigned to WANGLER JOHANNES (10)· patent assignee history
2012–2015Patents assigned to DEGUENTHER MARKUS (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT AG | 37 | 2004–2011 |
| ZEISS CARL SMT GMBH | 24 | 2011–2020 |
| ZEISS STIFTUNG | 15 | 1991–2003 |
| WANGLER JOHANNESself | 10 | 2012–2015 |
| DEGUENTHER MARKUS | 7 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koenigsbronn, DE | 38 | 2004–2020 |
| Königsbronn, DE | 24 | 2005–2011 |
| Konigsbronn, DE | 10 | 1991–2008 |
| Knigsbronn, DE | 7 | 2002–2004 |
| Kōnigsbronn, DE | 1 | 2004 |