Inventor
Paul Christiaan Hinnen
Inventor
Veldhoven, NL
Overview
Patents· 38 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G01BMeasuring length, thickness or similar linear dimensions8%
G06FElectric digital data processing8%
H01LSemiconductor devices7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
G02BOptical elements, systems or apparatus2%
Y10TTechnical subjects covered by former us classification1%
PatentTitleYear
11,101,185Method and apparatus to determine a patterning process parameter202111,101,184Method and apparatus to determine a patterning process parameter202111,092,900Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method202111,022,897Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets202110,996,570Metrology method, patterning device, apparatus and computer program202110,983,445Method and apparatus for measuring a parameter of interest using image plane detection techniques202110,901,323Metrology method and apparatus with increased bandwidth202110,811,323Method and apparatus to determine a patterning process parameter202010,732,514Metrology method and apparatus with increased bandwidth202010,615,084Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values202010,571,806Method and system to monitor a process apparatus202010,546,790Method and apparatus to determine a patterning process parameter202010,488,768Beat patterns for alignment on small metrology targets201910,481,503Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method201910,474,039Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method201910,453,758Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion201910,394,137Inspection method, lithographic apparatus, mask and substrate201910,133,191Method for determining a process window for a lithographic process, associated apparatuses and a computer program201810,054,862Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method201810,001,711Inspection method, lithographic apparatus, mask and substrate201810,001,710Inspection apparatus, inspection method, lithographic apparatus and manufacturing method20189,964,853Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method20189,939,735Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method20189,594,299'Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method'20179,217,916'Lithographic apparatus and device manufacturing method'20159,182,682'Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method'20158,830,447'Inspection method for lithography'20148,685,626'Method of measuring a characteristic'20148,263,296'Lithographic apparatus and device manufacturing method'20128,139,217'Alignment systems and methods for lithographic systems'20127,880,880'Alignment systems and methods for lithographic systems'20117,619,738'Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus'20097,573,574'Lithographic apparatus and device manufacturing method'20097,439,531'Alignment systems and methods for lithographic systems'20087,332,732'Alignment systems and methods for lithographic systems'20087,330,261'Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus'20087,329,888'Alignment systems and methods for lithographic systems'20087,297,971'Alignment systems and methods for lithographic systems'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2021Patents assigned to ASML NETHERLANDS BV (38)· patent assignee history
2007–2021Based in Veldhoven, NL· patent location history
2012–2015Patents assigned to HINNEN PAUL CHRISTIAAN (6)· patent assignee history
2012–2015Patents assigned to JUNGBLUT REINER MARIA (2)· patent assignee history
2012–2015Patents assigned to VAN DE KERKHOF MARCUS ADRIANUS (2)· patent assignee history
2014–2015Patents assigned to CRAMER HUGO AUGUSTINUS JOSEPH (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 38 | 2007–2021 |
| HINNEN PAUL CHRISTIAANself | 6 | 2012–2015 |
| CRAMER HUGO AUGUSTINUS JOSEPH | 2 | 2014–2015 |
| JUNGBLUT REINER MARIA | 2 | 2012–2015 |
| VAN DE KERKHOF MARCUS ADRIANUS | 2 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 38 | 2007–2021 |