Inventor
Ming-Chou Ho
Inventor
Hsinchu, TW
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Cprimary
G11CStatic stores47%
H10BElectronic memory devices31%
H10DInorganic electric semiconductor devices22%
PatentTitleYear
8,089,798'Method for operating one-time programmable read-only memory'20127,768,059'Nonvolatile single-poly memory device'20107,447,082'Method for operating single-poly non-volatile memory device'20087,433,243'Operation method of non-volatile memory'20086,920,067'Integrated circuit embedded with single-poly non-volatile memory'20056,914,825'Semiconductor memory device having improved data retention'20056,842,374'Method for operating N-channel electrically erasable programmable logic device'20056,822,286'Cmos-compatible read only memory and method for fabricating the same'20046,812,083'Fabrication method for non-volatile memory'20046,740,556'Method for forming EPROM with low leakage'20046,617,637'Electrically erasable programmable logic device'20036,417,046'Modified nitride spacer for solving charge retention issue in floating gate memory cell'20026,303,454'Process for a snap-back flash EEPROM cell'20016,117,732'Use of a metal contact structure to increase control gate coupling capacitance for a single polysilicon non-volatile memory cell'20006,055,183'Erase method of flash EEPROM by using snapback characteristic'20006,049,484'Erase method to improve flash EEPROM endurance by combining high voltage source erase and negative gate erase'20005,949,717'Method to improve flash EEPROM cell write/erase threshold voltage closure'19995,903,499'Method to erase a flash EEPROM using negative gate source erase followed by a high negative gate erase'19995,862,078'Mixed mode erase method to improve flash eeprom write/erase threshold closure'19995,838,618'Bi-modal erase method for eliminating cycling-induced flash EEPROM cell write/erase threshold closure'19985,726,933'Clipped sine shaped waveform to reduce the cycling-induced electron trapping in the tunneling oxide of flash EEPROM'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2002Patents assigned to TAIWAN SEMICONDUCTOR MFG (10)· patent assignee history
1998–2001Based in Taichung, TW· patent location history
2000Based in Taichang, TW· patent location history
2002–2012Based in Hsinchu, TW· patent location history
2003–2012Patents assigned to EMEMORY TECHNOLOGY INC (11)· patent assignee history
2012Patents assigned to CHING WEN-HAO (1)· patent assignee history
2012Patents assigned to HO MING-CHOU (1)· patent assignee history
2012Patents assigned to HUANG SHAO-CHANG (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EMEMORY TECHNOLOGY INC | 11 | 2003–2012 |
| TAIWAN SEMICONDUCTOR MFG | 10 | 1998–2002 |
| CHING WEN-HAO | 1 | 2012 |
| HO MING-CHOUself | 1 | 2012 |
| HUANG SHAO-CHANG | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 12 | 2002–2012 |
| Taichung, TW | 8 | 1998–2001 |
| Taichang, TW | 1 | 2000 |