Inventor
HUGO AUGUSTINUS JOSEPH CRAMER
Inventor
NL
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
G01NInvestigating or analysing materials by determining their chemical or physical properties18%
G01BMeasuring length, thickness or similar linear dimensions12%
H01LSemiconductor devices12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G06FElectric digital data processing10%
G03HHolographic processes or apparatus3%
G02BOptical elements, systems or apparatus2%
G05BControl or regulating systems in general2%
G06VImage or video recognition or understanding2%
PatentTitleYear
12,591,179Metrology apparatus202612,566,406Dark field digital holographic microscope and associated metrology method202612,405,535Method for filtering an image and associated metrology apparatus202512,322,660Method and apparatus to determine a patterning process parameter202512,142,535Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry202412,007,697Method for process metrology202411,982,946Metrology targets202411,940,739Metrology apparatus202411,784,098Method and apparatus to determine a patterning process parameter202311,728,224Method and apparatus to determine a patterning process parameter202311,710,668Method and apparatus to determine a patterning process parameter202311,650,047Metrology apparatus and method for determining a characteristic of one or more structures on a substrate202311,556,060Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus202311,520,239Separation of contributions to metrology data202211,385,551Method for process metrology202211,262,661Metrology apparatus202211,145,557Method and apparatus to determine a patterning process parameter2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2021–2026Based in NL· patent location history
2024–2025Patents assigned to ASML HOLDING NV (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2021–2026 |
| ASML HOLDING NV | 2 | 2024–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 17 | 2021–2026 |