Inventor

Yusuke Miyamoto

Inventor
Kyoto, JP

Overview

41→
Patents
1994–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 41 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y02Eprimary
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution11%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation10%
C25DProcesses for the electrolytic or electrophoretic production of coatings9%
H01LSemiconductor devices6%
H10HInorganic light-emitting semiconductor devices having potential barriers6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
C08LCompositions of macromolecular compounds5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C23CCoating metallic material4%
PatentTitleYear
10,756,364Fuel cell system and control method of fuel cell system2020D0894476Tobacco suction tool2020D0885651Tobacco suction tool202010,393,162Joint part and manufacturing method therefor201910,125,242Organosilicon compound, curable silicone composition, and semiconductor device20189,944,772Organosiloxane, curable silicone composition, and semiconductor device20189,902,811'Curable silicone composition, cured product thereof, and optical semiconductor device'20189,688,869'Curable silicone composition, and optical semiconductor device'20179,691,951'Curable silicone composition, and optical semiconductor device'20179,546,309'Curable silicone composition, cured product thereof, and optical semiconductor device'20179,464,211'Curable silicone composition and optical semiconductor device'20169,225,869'Image reading device and image forming apparatus'20159,013,726'Image reading device and image forming apparatus'20158,912,302'Curable silicone composition for sealing an optical semiconductor element, method of producing a resin-sealed optical semiconductor element, and resin-sealed optical semiconductor element'20148,634,106'Image processing device'20148,587,850'Image processing apparatus, image processing method and image scanning apparatus'20138,498,816'Systems including mobile devices and head-mountable displays that selectively display content, such mobile devices, and computer-readable storage media for controlling such mobile devices'20138,054,866'MC-CDMA system, transmitter and receiver'20117,850,502'Method of manufacturing electron-emitting device and method of manufacturing image display apparatus'20107,445,952'Method of forming laminate and method of manufacturing photovoltaic device'20087,282,132'Zinc oxide film treatment method and method of manufacturing photovoltaic device utilizing the same'20077,112,264'Plating apparatus and method'20066,951,771'Method of forming laminate and method of manufacturing photovoltaic device'20056,752,915'Web conveying apparatus, and apparatus and method for electrodeposition using web conveying apparatus'20046,733,650'Apparatus and process for producing zinc oxide film'20046,660,931'Substrate for solar cell, solar cell having the same, and production process of solar cell'20036,632,346'Process for electrodepositing zinc oxide film'20036,592,739'Process and apparatus for forming zinc oxide film, and process and apparatus for producing photovoltaic device'20036,576,112'Method of forming zinc oxide film and process for producing photovoltaic device using it'20036,544,877'Method of producing thin film of zinc oxide, process for manufacturing photovoltaic element using its method, and photovoltaic element'20036,475,367'Electrodeposition method'20026,471,848'Electrodeposition method of forming an oxide film'20026,456,391'Printer and printing method'20026,383,359'Method for forming a zinc oxide layer and method for producing a photovoltaic device'20026,350,489'Deposited-film forming process and deposited-film forming apparatus'20026,238,808'Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device'20016,224,736'Apparatus and method for forming thin film of zinc oxide'20015,737,150'Magnetic disk unit with an impact force applying mechanism'19985,676,765'Pin junction photovoltaic device having a multi-layered I-type semiconductor layer with a specific non-single crystal I-type layer formed by a microwave plasma CVD process'19975,571,749'Method and apparatus for forming deposited film'19965,327,454'Bridge for connecting cores in a manufacturing equipment of polycrystal silicon'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2010Patents assigned to CANON KK (20)· patent assignee history
2001–2003Based in Kyotanabe, JP· patent location history
2003–2011Based in Kyoto, JP· patent location history
2013–2015Patents assigned to BROTHER IND LTD (5)· patent assignee history
2013–2014Patents assigned to MIYAMOTO YUSUKE (3)· patent assignee history
2013–2019Based in Nagoya, JP· patent location history
2014–2018Patents assigned to DOW CORNING TORAY CO LTD (8)· patent assignee history
2014–2018Based in Ichihara, JP· patent location history
2018–2020Based in Tokyo, JP· patent location history
2020Patents assigned to JAPAN TOBACCO INC (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK201996–2010
DOW CORNING TORAY CO LTD82014–2018
BROTHER IND LTD52013–2015
MIYAMOTO YUSUKEself32013–2014
JAPAN TOBACCO INC22020
Locations
LocationPatentsSpan
Kyoto, JP102003–2011
Kyotanabe, JP72001–2003
Nagoya, JP62013–2019
Ichihara, JP42014–2018
Tokyo, JP32018–2020