Inventor
Tetsuo Kusumoto
Inventor
Kita-adachi-gun, JP
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere36%
C07CAcyclic or carbocyclic compounds17%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein17%
C07DHeterocyclic compounds13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
A61KPreparations for medical, dental or toiletry purposes1%
A61QSpecific use of cosmetics or similar toiletry preparations1%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium1%
H01LSemiconductor devices1%
PatentTitleYear
10,723,952Polymerizable compound and optically anisotropic body202010,544,365Nematic liquid crystal composition20209,688,787'Polymerizable compound having lateral substituent in terminal ring structure'20179,683,174'Compound, polymer, liquid crystal alignment layer, liquid crystal display device, and optically anisotropic material'20179,637,466'Liquid crystal compound having 2, 6-difluorophenyl ether structure and liquid crystal composition thereof'20179,605,208'Nematic liquid crystal composition'20179,587,175'Nematic liquid crystal composition'20179,573,923'Liquid crystal compound having 2, 6-difluorophenylether structure, and liquid crystal composition containing the same'20179,490,433'Benzothienobenzothiophene derivative, organic semiconductor material, and organic transistor'20169,321,961'Nematic liquid crystal composition'20169,315,727'Compound having fluorinated naphthalene structure and liquid crystal composition of the same'20169,255,055'Method for producing compound'20169,181,484'Compound having 2-fluorophenyloxymethane structure'20159,079,836'Compound having 2-fluorophenyloxymethane structure, a method for preparing the same, a liquid crystal composition and a liquid crystal device'20159,039,929'Nematic liquid crystal composition'20158,916,718'Compound having 2-fluorophenyloxymethane structure'20148,003,006'Difluorobenzene derivative and nematic liquid crystal composition using the same'20117,919,154'1-(trifluoromethyl)naphthalene derivative'20117,670,504'Nematic liquid crystal composition and liquid crystal display device using the same'20107,651,630'Difluorobenzene derivative and nematic liquid crystal composition using the same'20107,232,592'Nematic liquid crystal composition containing indane compound'20077,226,644'Chroman derivative and liquid-crystal composition containing the compound'20077,214,835'1,7,8-Trifluoronaphthalene-2-naphthol, and method for producing liquid crystal compound using same'20076,746,728'Compound having tetrahydronaphthalene skeleton and liquid crystal composition containing same'20045,061,398'Optically active lactone derivative, intermediate therefor, process for producing the intermediate, liquid-crystal composition, and liquid-crystal display device'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2020Patents assigned to DAINIPPON INK & CHEMICALS (25)· patent assignee history
1991Based in Kanagawa, JP· patent location history
2004–2020Based in Kita-adachi-gun, JP· patent location history
2007–2011Based in Ageo, JP· patent location history
2014–2015Patents assigned to KANEOYA MASAKAZU (2)· patent assignee history
2014–2015Patents assigned to KUSUMOTO TETSUO (2)· patent assignee history
2014–2015Patents assigned to OSAWA MASASHI (2)· patent assignee history
2016Patents assigned to DIC CORP TOKYO (2)· patent assignee history
2016Based in Saitama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DAINIPPON INK & CHEMICALS | 25 | 1991–2020 |
| DIC CORP TOKYO | 2 | 2016 |
| KANEOYA MASAKAZU | 2 | 2014–2015 |
| KUSUMOTO TETSUOself | 2 | 2014–2015 |
| OSAWA MASASHI | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kita-adachi-gun, JP | 17 | 2004–2020 |
| Ageo, JP | 6 | 2007–2011 |
| Saitama, JP | 1 | 2016 |
| Kanagawa, JP | 1 | 1991 |