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Inventor

Yasushi Higuchi

Inventor
Kariya, JP

Overview

44→
Patents
1981–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 44 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices20%
C07CAcyclic or carbocyclic compounds10%
H01LSemiconductor devices10%
C23CCoating metallic material9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
H01JElectric discharge tubes or discharge lamps6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
C07DHeterocyclic compounds3%
PatentTitleYear
10,714,606Semiconductor device202010,403,745Nitride semiconductor device including a horizontal switching device201910,109,727Semiconductor device201810,062,747Semiconductor device20189,231,090'Trench-gate-type insulated gate bipolar transistor'20169,216,609'Radical etching apparatus and method'20159,178,050'Load-short-circuit-tolerant semiconductor device having trench gates'20158,883,632'Manufacturing method and manufacturing apparatus of device'20148,815,737'Method for forming NiSi film, method for forming silicide film, method for forming metal film for use in silicide-annealing, apparatus for vacuum processing and film-forming apparatus'20148,669,191'Method for forming Ni film'20148,659,065'Semiconductor device and method of manufacturing the same'20148,022,477'Semiconductor apparatus having lateral type MIS transistor'20117,893,458'Semiconductor device having lateral MOS transistor and zener diode'20117,470,525'Process for producing optically active 2-alkycysteine, derivative thereof, and processes for production'20087,208,631'2-alkylcysteinamide or salt thereof, process for producing these, and use of these'20076,967,258'Production of quaternary ammonium salt of hydroxycarboxylic acid and quaternary ammonium salt of inorganic acid'20056,784,317'Production of quaternary ammonium salt of hydroxycarboxylic acid and quarternary ammonium salt of inorganic acid'20046,413,392'Sputtering device'20026,337,249'Semiconductor device and fabrication process thereof'20026,290,826'Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly'20016,217,730'Sputtering device'20015,980,790'Process for producing a copolymer'19995,900,491'Preparation process and purification process of cyclic ester'19995,804,676'Process for preparing polymer'19985,719,242'Process for preparing methyl methacrylate polymer'19985,708,133'Process for purifying polymer'19985,675,167'Enhancement-type semiconductor having reduced leakage current'19975,599,888'Process for preparing methyl methacrylate polymer'19975,342,802'Method of manufacturing a complementary MIS transistor'19945,216,272'High withstanding voltage MIS transistor'19935,180,476'Method for producing transparent conductive films'19935,116,479'Process for producing transparent conductive film comprising indium oxide'19925,036,019'Method of producing a complementary-type semiconductor device'19915,019,526'Method of manufacturing a semiconductor device having a plurality of elements'19914,989,064'Aluminum alloy line resistive to stress migration formed in semiconductor integrated circuit'19914,952,665'Process for production of aromatic polyethers with alkali metal carbonate/bicarbonate/fluoride cocatalyst'19904,924,277'MIS transistor device'19904,832,810'Co-based alloy sputter target and process of manufacturing the same'19894,822,933'Process for producing a chlorohalobenzene'19894,794,201'Process for preparation of p-halogeno-monoalkylbenzenes'19884,754,086'Process for preparation of nuclear halides of monoalkylbenzenes'19884,390,723'Process for producing hydroxyphenyl aliphatic acid derivatives'19834,307,034'Inert organic solvent dispersion of alkali hydroxide and reaction using the same'19814,280,958'Process for producing indoline derivative'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981–1989Patents assigned to IHARA CHEMICAL IND CO (6)· patent assignee history
1981–2015Based in Shizuoka, JP· patent location history
1989–2002Patents assigned to ULVAC CORP (6)· patent assignee history
1990–2008Patents assigned to MITSUBISHI GAS CHEMICAL CO (11)· patent assignee history
1990–2002Patents assigned to NIPPON DENSO CO (8)· patent assignee history
1990–2020Based in Kariya, JP· patent location history
1997–2016Based in Okazaki, JP· patent location history
1997–1998Based in Hiratsuka, JP· patent location history
2007–2008Based in Tokyo, JP· patent location history
2011–2020Patents assigned to DENSO CORP (9)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO111990–2008
DENSO CORP92011–2020
NIPPON DENSO CO81990–2002
IHARA CHEMICAL IND CO61981–1989
ULVAC CORP61989–2002
Locations
LocationPatentsSpan
Kariya, JP101990–2020
Shizuoka, JP91981–2015
Okazaki, JP71997–2016
Hiratsuka, JP41997–1998
Tokyo, JP22007–2008