Inventor

Masaru Sano

Inventor

Kanagawa, JP

Overview

1978–2006

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Cprimary

G03CPhotosensitive materials for photographic purposes20%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%

B01DSeparation13%

G03GElectrography13%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%

C01BNon-metallic elements7%

H03BGeneration of oscillations, directly or by frequency-changing, by circuits employing active elements which operate in a non-switching manner7%

H03JTuning resonant circuits7%

Y02WClimate change mitigation technologies related to wastewater treatment or waste management7%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1978Patents assigned to NITTETSU KAKOKI KK (1)· patent assignee history

1978–1999Based in Tokyo, JP· patent location history

1988–1990Patents assigned to FUJI PHOTO FILM CO LTD (3)· patent assignee history

1988–2006Based in Kanagawa, JP· patent location history

1989–1990Based in Minami-ashigara, JP· patent location history

1998–1999Patents assigned to KONISHIROKU PHOTO IND (2)· patent assignee history

1998Based in Hachioji, JP· patent location history

2004Patents assigned to TOSHIBA KK (1)· patent assignee history

2006Patents assigned to MITSUBISHI CHEM CORP (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations